300 mm wafer용 ICP dry etcher의 수치 모델링

주정훈 ,  김남헌

한국진공학회 학술발표회초록집

2015 .02

Dry Etcher에서 ESC의 중요성

김남헌

한국진공학회 학술발표회초록집

2017 .08

Newly Designed Ion Beam Etcher with High Etch Rate

Hee-Woon Cheong

Journal of Magnetics

2015 .12

Correlation between Coil Configurations and Discharge Characteristics of a Magnetized Inductively Coupled Plasma

Hee-Woon Cheong

Journal of Magnetics

2016 .06

반도체 식각 공정에서 분압 측정 및 활용

주정훈

한국진공학회 학술발표회초록집

2020 .08

Magnetic Flux Density Distributions and Discharge Characteristics of a Newly Designed Magnetized Inductively Coupled Plasma

Hee-Woon Cheong

Journal of Magnetics

2015 .12

Dry etching of Al₂O₃ thin films in inductively coupled plasma system

Seok SON ,  Young Hee JOO ,  Chang Il KIM

한국진공학회 학술발표회초록집

2016 .08

Analysis of chemical reactions of CF₄ and C₄F₈ for inductively coupled plasma based on plasma parameters

J. J. Lee ,  S. J. Kim ,  Y. S. Lee 외 2명

한국진공학회 학술발표회초록집

2019 .08

300 mm wafer 용 ICP dry etcher의 foreline clamp 파손에 따른 터보 분자 펌프의 파괴 양상 분석

정진용 ,  임진형 ,  이인택 외 2명

한국진공학회 학술발표회초록집

2015 .02

Elemental analysis of rice using laser ablation inductively coupled plasma mass spectrometry(LA-ICP-MS)

Seyeon kim ,  Sung-Youn Kim ,  Dong-jin Kang 외 4명

한국분석과학회 학술대회

2022 .11

Numerical Simulation : Effects of Gas Flow and Heat Transfer on Polymer Deposition in a Plasma Dry Etcher

Junghoon Joo

Applied Science and Convergence Technology

2017 .11

ICP 소스 외벽에 플라즈마가 미치는 온도 분포

김동훈 ,  윤성진 ,  유상문 외 1명

한국진공학회 학술발표회초록집

2018 .02

Experimental investigation on plasma density distribution at a wafer-level in an inductively coupled plasma using multiple passive resonant antennas

홍영훈 ,  김주호 ,  이무현 외 2명

한국진공학회 학술발표회초록집

2020 .08

Interpretation of current decrease during E - H mode transition in a cylindrical inductively coupled plasma

Jun-Hyeon Moon ,  Ho-Jun Moon ,  Chin-Wook Chung

한국진공학회 학술발표회초록집

2018 .08

Diagnostics and modeling of inductively coupled methane plasma using the electrostatic probe and plasma simulations

차주홍 ,  이호준

한국진공학회 학술발표회초록집

2017 .02

Research on parallelization mechanism of inductively coupled plasma for large area plasma source

이장재 ,  김시준 ,  김광기 외 5명

한국진공학회 학술발표회초록집

2016 .02

A Review of Inductively Coupled Plasma-Assisted Magnetron Sputter System

Tae Hyung Kim ,  Geun Young Yeom

Applied Science and Convergence Technology

2019 .09

Effects of pulse modulation in Ar/H₂ inductively coupled plasma using fluid simulation

서권상 ,  김동현 ,  이호준

한국진공학회 학술발표회초록집

2017 .08

Brief Review of Atomic Layer Etching Based on Radiofrequency-Biased Ar/C₄F₆-Mixture-Based Inductively Coupled Plasma Characteristics

Min Young Yoon ,  Hee Jung Yeom ,  Jong-Ryul Jeong 외 2명

Applied Science and Convergence Technology

2023 .03

Electrical Characteristics of Inductively Coupled Plasma Sources using Magnetic Resonance Wireless Power Transmission System

Ju-Ho Kim ,  Chin-Wook Chung

한국진공학회 학술발표회초록집

2020 .08