지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
커뮤니티
연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 2016.6
- 수록면
- 222 - 228 (7page)
이용수
초록· 키워드
오류제보하기
Correlation between coil configurations and the discharge characteristics such as plasma density and the electron temperature in a newly designed magnetized inductively coupled plasma (M-ICP) etcher were investigated. Radial and axial magnetic flux density distributions as well as the magnetic flux density on the center of the substrate holder were controllable by placing multiple circular coils around the etcher. The plasma density increased up to 60.7% by arranging coils (or optimizing magnetic flux density distributions inside the etcher) properly although the magnetic flux density on the center of the substrate holder was fixed at 7 Gauss.
목차
1. Introduction
2. Experimental setup
3. Results and Discussion
4. Conclusion
References
참고문헌 (11)
참고문헌 신청
[학술지(정기간행물)] - S. Imai / 2008 / / J. Vac. Sci. Technol. B 26 : 2008 ~
[학술지(정기간행물)] - A. C. Westerheim / 1995 / / J. Vac. Sci. Technol. A 13 : 853 ~
[학술지(정기간행물)] - H. H. Doh / 1997 / / J. Vac. Sci. Technol. A 15 : 664 ~
[학술지(정기간행물)] - K. Nojiri / 1995 / / J. Vac. Sci. Technol. B 13 : 1451 ~
[학술지(정기간행물)] - T. Maruyama / 2010 / / J. Vac. Sci. Technol. B 28 : 854 ~
[학술지(정기간행물)] - A. C. Westerheim / 1995 / / J. Vac. Sci. Technol. A 13 : 853 ~
[학술지(정기간행물)] - H. H. Doh / 1997 / / J. Vac. Sci. Technol. A 15 : 664 ~
[학술지(정기간행물)] - K. Nojiri / 1995 / / J. Vac. Sci. Technol. B 13 : 1451 ~
[학술지(정기간행물)] - T. Maruyama / 2010 / / J. Vac. Sci. Technol. B 28 : 854 ~
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UCI(KEPA) : I410-ECN-0101-2017-428-000656390