New Developments in 1 : 1 Optical Lithography

Hwan J. Jeong ,  Dave Ma ,  kle

대한전자공학회 워크샵

1991 .01

Optical Lithography at Low K Factors

Ha ,  y Sewell

International Conference on Electronics, Informations and Communications

1998 .01

Characterization of Proximity Correction in 0.1mm Regime X-Ray Lithography

M. Yi ,  E. Seo ,  Y. Seo 외 2명

International Conference on Electronics, Informations and Communications

1998 .01

A New Approach of E-Beam Proximity Effect Correction for High-Resolution Applications

Michal Simecek ,  Anja Rosenbusch ,  Tsuneaki Ohta 외 1명

International Conference on Electronics, Informations and Communications

1998 .01

High Precision Dose Correction for Proximity Correction in Electron Beam lithography on a Sub O.2mm Device

양현조 ,  최용규 ,  허훈 외 1명

대한전자공학회 학술대회

1998 .01

전자빔 리소그래피에서의 근접효과 보정을 이용한 패턴 제작에 관한 연구

오세규 ,  김동환 ,  김승재

반도체및디스플레이장비학회지

2009 .01

전자빔 리소그래피에서의 근접효과 보정

오세규 ,  김승재 ,  정광오 외 1명

한국생산제조학회 학술발표대회 논문집

2009 .05

High-Resolution Optical Measurement of Fiber Optics Transmission Line Length

Takeshi Tsujimu ,  a ,  Koichi Yoshida 외 5명

제어로봇시스템학회 국제학술대회 논문집

2009 .08

Sub-Half Micron Optical Lithography with dry Development

백기호

대한전자공학회 워크샵

1989 .01

Optical Lithography Simulation Based on Rigorous Diffraction Theory

Kyung Il Lee ,  Seung Gol Lee ,  Jong Ung Lee

대한전자공학회 학술대회

1997 .01

Simulation of Electron Trajectory in the Cell-Projection Lithography Optical System

K. Yamaguchi ,  M. Kote ,  a

International Conference on Electronics, Informations and Communications

1998 .01

Monte-Carlo Based Optical Proximity Correction for the Half-Tone Phase Shift Mask

Yong Ho Oh ,  Jai Cheol Lee ,  Ssung Woo Lim

International Conference on Electronics, Informations and Communications

1998 .01

광학식 근접 센서의 설계

고명삼 ,  송진일

대한전기학회 학술대회 논문집

1985 .07

Optical Systems

김창곤

대한기계학회 춘추학술대회

2012 .05

A study on the optical measurement using rapid optical delay line

Daeseok Hwang ,  Young-Woo Lee

한국정보기술학회논문지

2007 .09

Proximity Effect Correction by Pattern Modified Stencil Mask in Large Field Projection Electron-Beam Lithography

Hideo Kobinata ,  Hi ,  oshi Yamashita 외 4명

International Conference on Electronics, Informations and Communications

1998 .01

[특집:Optical Internet 기술]Optical Transmission Systems(Recent developments & an example analysis)

박남규 ,  주무정 ,  이종현 외 4명

전자공학회지

2003 .02

Enhancement of Alignment Accuracy with a Novel X-ray Mask in Mix-and-Match of Optical and X-ray Lithography

최상수 ,  전영진 ,  Enzo Di Fab 외 6명

ICVC : International Conference on VLSI and CAD

1997 .01

Optical Neural Computer

김은수

한국통신학회 워크샵

1989 .01

Optical Neural Computer

김은수

대한전자공학회 워크샵

1989 .01