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논문 기본 정보

자료유형
학술저널
저자정보
Chun, Hui-Gon (School of Materials Science and Engineering, ReMM, University of Ulsan) Sochugov, Nikolay S. (Institute of High Current Electronics, Siberian Division of Russian Academy of Science) You, Yong-Zoo (School of Materials Science and Engineering, ReMM, University of Ulsan) Soloviv, Andrew A. (Institute of High Current Electronics, Siberian Division of Russian Academy of Science) Zakharov, Alexander N, (Institute of High Current Electronics, Siberian Division of Russian Academy of Science)
저널정보
한국반도체디스플레이기술학회 한국반도체장비학회지 한국반도체장비학회지 제2권 제3호
발행연도
2003.1
수록면
19 - 23 (5page)

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Extended unbalanced magnetron sputtering system based on the cylindrical magnetron with a rotating cathode was developed. The unbalanced configuration of magnetic field was realized by means of additional lines of permanent magnets, placed along both sides of a 89 mm outer diameter and 600 mm long cylindrical cathode. The performance of the unbalanced magnetron was assessed in terms of the ion current density and the ion-to-atom ratio incident at the substrate. Furthermore, the paper presents the comparison of the internal plasma parameters, such as the electron temperature, electron density, plasma and floating potentials, measured by a Langmuir probe in various positions from the cathode, for conventional and unbalanced constructions of the cylindrical magnetron. The plasma density and ion current density are about 3-5 times higher than those of conventional one, in the unbalanced magnetron in a 0.24 Pa Ar atmosphere with a DC cathode power of 3 kW.

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