Chemically Amplified Positive Resists for ArF Excimer Laser Lithography

안성남 ,  강영종 ,  이해원 외 3명

한국고분자학회 학술대회 연구논문 초록집

1996 .10

Chemically Amplified Photoresists for ArF Excimer Laser Lithography

김영대 ,  강영종 ,  이해원

대한전자공학회 학술대회

1998 .01

Silicon Containing Positive Resist for ArF Excimer Laser Lithography

이해원 ,  김영대 ,  강영종 외 3명

한국고분자학회 학술대회 연구논문 초록집

1997 .10

ArF Excimer Laser Lithography

Masa ,  u Sasago

International Conference on Electronics, Informations and Communications

1998 .01

Silicon Containing Photoresists for ArF Excimer Laser Lithography

Young Dae Kim ,  Sang Jin Pa ,  k 외 4명

International Conference on Electronics, Informations and Communications

1998 .01

Study of Bottom Antireflective Coating Process Using a High-Transparency Resist for ArF Excimer Laser Lithography

Shinji Kishimu ,  a ,  Makoto Takahashi 외 3명

International Conference on Electronics, Informations and Communications

1998 .01

Novel Chemically Amplified Resists for Electron Beam Lithography

이해원 ,  이석규

한국고분자학회 학술대회 연구논문 초록집

1992 .10

Novel Single-Layer Chemically Amplified Resist for 193 nm Lithography

최상준 ,  강율 ,  정동원 외 1명

한국고분자학회 학술대회 연구논문 초록집

1997 .04

The Optical System for ArF Excimer Laser Exposure Tool

정해빈 ,  이각현 ,  김도훈 외 2명

대한전자공학회 학술대회

1997 .01

Application of New Empirical Model to the Electron Beam Lithography Process with Chemically Amplified Resists

Young Mog Ham ,  Cheol Hu ,  Chang Nam Ahn 외 4명

International Conference on Electronics, Informations and Communications

1998 .01

Excimer Laser Lithography Equipment

이종현

대한전자공학회 워크샵

1989 .01

Dissolution Characteristics and Surface Morphology of Chemically Amplified Positive Resists in X-Ray Lithography

Ji ,  o Nakamu ,  a 외 3명

International Conference on Electronics, Informations and Communications

1998 .01

A Silicon Containing Resist for KrF Excimer Laser Lithography

박상진 ,  이해원

한국고분자학회 학술대회 연구논문 초록집

1998 .04

ArF Excimer Laser용 광학계의 Tolerancing

이각현 ,  정해빈 ,  유현준

광학세계

1994 .01

Acid Diffusion Control in Chemically Amplified Positive Resists

김진백 ,  권영길 ,  최재학

한국고분자학회 학술대회 연구논문 초록집

1998 .04

Hindered amine additives for post-exposure delay stability in ArF chemically amplified resists

김진백 ,  권영길 ,  윤효진 외 1명

한국고분자학회 학술대회 연구논문 초록집

2000 .04

Charge Reducing Effect of Chemically Amplified Resist

Tetsu ,  o Nakasugi ,  Shunko Magoshi 외 5명

International Conference on Electronics, Informations and Communications

1998 .01

극자외선 리소그래피용 화학증폭형 레지스트

최재학 ,  노영창 ,  홍성권

공업화학

2006 .01

Synthesis of Copolymers Containing 3-Hydroxycyclohexyl Methacrylate and Their Application as ArF Excimer Laser Resists

김진백 ,  김재영

한국고분자학회 학술대회 연구논문 초록집

1998 .04

Directed assembly of block copolymers on chemically patterned substrates prepared by conventional ArF lithography

최영주 ,  박승학 ,  신동옥 외 2명

한국고분자학회 학술대회 연구논문 초록집

2011 .10