Effects of CH₂F₂ and H₂ flow rates on process window for infinite etch selectivity of silicon nitride to PVD a-C in dual-frequency capacitively coupled plasmas

김진성 ,  권봉수 ,  안정호 외 2명

한국진공학회 학술발표회초록집

2009 .02

Process window for infinitely high etch selectivity of TEOS oxide to PVD a-C in dual-frequency capacitively coupled C₄F₈/CH₂F₂/O₂/Ar plasmas

권봉수 ,  김진성 ,  안정호 외 6명

한국진공학회 학술발표회초록집

2009 .08

Frequency effect of TEOS oxide layer in dual-frequency capacitively coupled CH2F2/C4F8/O2/Ar plasma

J. H. Lee ,  B. S. Kwon ,  N.-E. Lee

한국진공학회 학술발표회초록집

2011 .02

Etching Characteristics of Au Film using Capacitively Coupled CF4/Ar Plasma

Kim ,  Gwang-Beom ,  Hong 외 1명

동굴

2007 .01

Role of N₂ flow rate on etch characteristics and variation of line edge roughness during etching of silicon nitride with extreme ultra-violet resist pattern in dual-frequency CH₂F₂/N₂/Ar capacitively coupled plasmas

권봉수 ,  정창룡 ,  이내응 외 1명

한국진공학회 학술발표회초록집

2010 .02

Highly selective etching of silicon nitride to CVD a-C in dual-frequency capacitively coupled CH₂F₂/H₂plasmas

김진성 ,  권봉수 ,  안정호 외 6명

한국진공학회 학술발표회초록집

2009 .08

Etching characteristics of ArF and EUV resists in dual-frequency superimposed capacitively coupled CF₄/O₂/Ar and CF₄/CHF₃/O₂/Ar plasmas

권봉수 ,  박영록 ,  김진성 외 4명

한국진공학회 학술발표회초록집

2008 .08

Characteristics of SiO₂ Etching in a C4F8/Ar/O₂ pulse modulation capacitively coupled plasma

조철희 ,  김시준 ,  이장재 외 4명

한국진공학회 학술발표회초록집

2018 .02

Comparison of etching characteristics of ArF and EUV photoresists in dual-frequency superimposed capacitively coupled plasmas (DFS-CCP)

B. S. Kwon ,  H. W. Kim ,  H. J. Lee 외 3명

한국진공학회 학술발표회초록집

2008 .02

Infinitely high etch selectivity of indium tin oxide (ITO) layer to photoresist during CH₄/H₂/Ar inductively coupled plasma (ICP) etching

D. Y. Kim ,  J. H. Ko ,  M. S. Pa 외 2명

한국진공학회 학술발표회초록집

2006 .08

Microtrenching of SiO₂ contact hole etching in C₄F₈/Ar capacitively coupled plasma

S. J. Kim ,  J. J. Lee ,  H. J. Yeom 외 2명

한국진공학회 학술발표회초록집

2017 .08

Role of gas flow rate during etching of hard-mask layer to extreme ultra-violet resist in dual-frequency capacitively coupled plasmas

권봉수 ,  이정훈 ,  이내응

한국진공학회 학술발표회초록집

2010 .08

Effect of high - frequency variation on ArF PR deformation and silicon nitride etching by dual frequency superimposed (DFS rf capacitive coupled plasma

N. E. Lee ,  D. H. Kim

한국진공학회 학술발표회초록집

2004 .08

Effects of Etch Parameters on Etching of CoFeB Thin Films in CH₄/O₂/Ar Mix

Tea Young Lee ,  Il Hoon Lee ,  Chee Won Chung

한국진공학회 학술발표회초록집

2012 .02

Etching characteristics of DLC-hard mask using dual frequency superimposed capacitively coupled plasmas (DFS-CCP)

H. T. Kim ,  B. S. Kwon ,  N.-E. Lee 외 2명

한국진공학회 학술발표회초록집

2007 .02

Etch Characteristics of IrMn Thin Films Using an Inductively Coupled Plasma of CH₃OH/Ar

Y. B. Xiao ,  E. H. Kim ,  S .M. Kong 외 1명

한국자기학회 학술연구발표회 논문개요집

2010 .12

Etch Characteristics of MgO Thin Films in Cl2/Ar, CH3OH/Ar, and CH4/Ar Plasmas

Il Hoon Lee ,  Tea Young Lee ,  Chee Won Chung

한국진공학회 학술발표회초록집

2013 .02

Anisotropic etching of polysilicon in a Cl₂/ CH₃Br / O₂ Plasma

Whi Kun Yi

Journal of Korean Vacuum Science & Technology

1999 .04

Effects of pulsed inductively coupled Cl₂/Ar plasma for the etching of Si nanostructure

신예지 ,  김교운 ,  김희주 외 4명

한국진공학회 학술발표회초록집

2020 .02

Surface Etching of Si(100) by Atomic Hydrogen

J. Y. Maeng ,  S. K. Jo ,  S. Kim

한국진공학회 학술발표회초록집

2000 .07