유도결합형 Ar / CH₄ 플라즈마를 이용한 ITO의 식각 특성에 관한 연구

박준용 ,  김현수 ,  권광호 외 2명

Applied Science and Convergence Technology

1999 .12

Process window for infinitely high etch selectivity of TEOS oxide to PVD a-C in dual-frequency capacitively coupled C₄F₈/CH₂F₂/O₂/Ar plasmas

권봉수 ,  김진성 ,  안정호 외 6명

한국진공학회 학술발표회초록집

2009 .08

Etch Characteristics of IrMn Thin Films Using an Inductively Coupled Plasma of CH₃OH/Ar

Y. B. Xiao ,  E. H. Kim ,  S .M. Kong 외 1명

한국자기학회 학술연구발표회 논문개요집

2010 .12

Effects of Etch Parameters on Etching of CoFeB Thin Films in CH₄/O₂/Ar Mix

Tea Young Lee ,  Il Hoon Lee ,  Chee Won Chung

한국진공학회 학술발표회초록집

2012 .02

Mechanism of infinite Si₃N₄/ArF PR etch selectivity during CH₂F₂/H₂/Ar dual frequency capacitively coupled plasma etching of Si3N4 layers

박창기 ,  김희대 ,  이춘희 외 1명

한국진공학회 학술발표회초록집

2006 .08

Selective Etching of Magnetic Layer Using CO/NH₃ in an ICP Etching System

J. Y. Pa ,  k ,  S.-K Kang 외 2명

한국진공학회 학술발표회초록집

2010 .02

Etch Characteristics of MgO Thin Films in Cl2/Ar, CH3OH/Ar, and CH4/Ar Plasmas

Il Hoon Lee ,  Tea Young Lee ,  Chee Won Chung

한국진공학회 학술발표회초록집

2013 .02

Etch Characteristics of FePt Magnetic Thin Films Using Inductively Coupled Plasma Reactive Ion Etching

Eun Ho Kim ,  Yu Bin Xiao ,  Hwa Won Lee 외 1명

한국자기학회 학술연구발표회 논문개요집

2010 .12

Etching Characteristics of Au Film using Capacitively Coupled CF4/Ar Plasma

Kim ,  Gwang-Beom ,  Hong 외 1명

동굴

2007 .01

Etching characteristics of ZnO thin films using inductively coupled BCl₃ / Ar and Cl₂ / Ar plasma

S-W. Na ,  M-H. Shin ,  Y-M. Chung 외 4명

한국진공학회 학술발표회초록집

2004 .08

Etching characteristics of Ta and TaN using Cl2 / Ar inductively coupled plasma

M. H. Shin ,  S. W. Na ,  N.-E. Lee 외 1명

한국진공학회 학술발표회초록집

2004 .08

Investigation on Etch Characteristics of FePt Magnetic Thin Films Using a CH4/Ar Plasma

Eun Ho Kim ,  Hwa Won Lee ,  Tae Young Lee 외 1명

한국진공학회 학술발표회초록집

2011 .02

Inductively coupled plasma etching of chemical vapor deposition amorphous carbon in O₂/N₂/Ar chemistries

H.J. Lee ,  Y.R. Pa ,  k 외 6명

한국진공학회 학술발표회초록집

2008 .08

Inductively Coupled Plasma Reactive Ion Etching of MgO Thin Films Using a CH₄/Ar Plasma

Hwa Won Lee ,  Eun Ho Kim ,  Tae Young Lee 외 1명

한국진공학회 학술발표회초록집

2011 .02

Dry etching of SiC in inductively coupled $SF_6/O_2$ Plasma

Yim ,  Jeong-Hyuk ,  Lee 외 13명

한국결정학회 학술연구발표회

2007 .01

The Influence of O₂ Gas on the Etch Characteristics of FePt Thin Films in CH₄/O₂/Ar gas

Il Hoon Lee ,  Tea Young Lee ,  Chee Won Chung

한국진공학회 학술발표회초록집

2012 .02

Silicon oxide etching studies in inductively coupled fluorocarbon plasmas

Won-Seok Chang ,  Deuk-Chul Kwon ,  Mi-Young Song 외 7명

한국진공학회 학술발표회초록집

2017 .02

Characterization of inductively coupled Ar/CH4 plasma using tuned single langmuir probe and fluid simulation

차주홍 ,  한문기 ,  김동현 외 2명

한국진공학회 학술발표회초록집

2015 .08

Effects of pulsed inductively coupled Cl₂/Ar plasma for the etching of Si nanostructure

신예지 ,  김교운 ,  김희주 외 4명

한국진공학회 학술발표회초록집

2020 .02

Anisotropic etching of polysilicon in a Cl₂/ CH₃Br / O₂ Plasma

Whi Kun Yi

Journal of Korean Vacuum Science & Technology

1999 .04