Etching characteristics of ZnO thin films using inductively coupled BCl₃ / Ar and Cl₂ / Ar plasma

S-W. Na ,  M-H. Shin ,  Y-M. Chung 외 4명

한국진공학회 학술발표회초록집

2004 .08

Etching characteristics of Ta and TaN using Cl2 / Ar inductively coupled plasma

M. H. Shin ,  S. W. Na ,  N.-E. Lee 외 1명

한국진공학회 학술발표회초록집

2004 .08

Inductively Coupled Plasma Reactive Ion Etching of MgO Thin Films Using a CH₄/Ar Plasma

Hwa Won Lee ,  Eun Ho Kim ,  Tae Young Lee 외 1명

한국진공학회 학술발표회초록집

2011 .02

Etch Characteristics of IrMn Thin Films Using an Inductively Coupled Plasma of CH₃OH/Ar

Y. B. Xiao ,  E. H. Kim ,  S .M. Kong 외 1명

한국자기학회 학술연구발표회 논문개요집

2010 .12

Low - k plasma polymerized methyl - cyclohexane thin films deposited by inductively coupled plasma chemical vapor deposition

조현욱 ,  권영춘 ,  양재영 외 1명

한국진공학회 학술발표회초록집

2000 .02

Dry etching of Al₂O₃ thin films in inductively coupled plasma system

Seok SON ,  Young Hee JOO ,  Chang Il KIM

한국진공학회 학술발표회초록집

2016 .08

Inductively Coupled Plasma의 Numerical Simulation

주정훈

한국진공학회 학술발표회초록집

1998 .07

Characterization of inductively coupled Ar/CH4 plasma using tuned single langmuir probe and fluid simulation

차주홍 ,  한문기 ,  김동현 외 2명

한국진공학회 학술발표회초록집

2015 .08

Dry etching of SiC in inductively coupled $SF_6/O_2$ Plasma

Yim ,  Jeong-Hyuk ,  Lee 외 13명

한국결정학회 학술연구발표회

2007 .01

Analysis of chemical reactions of CF₄ and C₄F₈ for inductively coupled plasma based on plasma parameters

J. J. Lee ,  S. J. Kim ,  Y. S. Lee 외 2명

한국진공학회 학술발표회초록집

2019 .08

Si Fin etching using Cl₂/Ar Sync, Asynchronized Pulsed Inductively Coupled Plasmas

김희주 ,  김교운 ,  홍종우 외 2명

한국진공학회 학술발표회초록집

2020 .08

Etch Characteristics of FePt Magnetic Thin Films Using Inductively Coupled Plasma Reactive Ion Etching

Eun Ho Kim ,  Yu Bin Xiao ,  Hwa Won Lee 외 1명

한국자기학회 학술연구발표회 논문개요집

2010 .12

Plasma parameters variation in O₂ / He, Ar, Xe inductively coupled plasma as a function of mixing ratio

배근희 ,  유신재 ,  엄환섭 외 1명

한국진공학회 학술발표회초록집

2001 .07

Properties of Inductively coupled Ar/CH4 plasma based on plasma diagnostics with fluid simulation

차주홍 ,  손의정 ,  윤용수 외 3명

한국진공학회 학술발표회초록집

2016 .02

Two - dimensional simulation of inductively coupled large - area plasma source

S. E. Pa ,  k ,  J. K. Lee 외 2명

한국진공학회 학술발표회초록집

2002 .02

Numerical modeling of Si/SiO₂ etching with inductively coupled CF4 plasma

양원균 ,  주정훈

한국진공학회 학술발표회초록집

2010 .08

Growth of carbon nanotubes on metal substrates using plasma - enhanced chemical vapor deposition

Se ,  ng-Ye ,  l Pa 외 9명

한국진공학회 학술발표회초록집

2002 .06

Numerical Modeling of an Inductively Coupled Plasma Sputter Sublimation Deposition System

Junghoon Joo

Applied Science and Convergence Technology

2014 .07

Infinitely high etch selectivity of indium tin oxide (ITO) layer to photoresist during CH₄/H₂/Ar inductively coupled plasma (ICP) etching

D. Y. Kim ,  J. H. Ko ,  M. S. Pa 외 2명

한국진공학회 학술발표회초록집

2006 .08

Change the Properties of Amorphous Carbon Hardmask Film Prepared with the Variation of Process Parameters in Plasma Enhanced Chemical Vapor Depostion Systems

Seok Hwan Kim ,  Sanghak Yeo ,  Jaeyoung Yang 외 5명

한국진공학회 학술발표회초록집

2014 .02