Etching characteristics of ZnO thin films using inductively coupled BCl₃ / Ar and Cl₂ / Ar plasma

S-W. Na ,  M-H. Shin ,  Y-M. Chung 외 4명

한국진공학회 학술발표회초록집

2004 .08

Etch Characteristics of IrMn Thin Films Using an Inductively Coupled Plasma of CH₃OH/Ar

Y. B. Xiao ,  E. H. Kim ,  S .M. Kong 외 1명

한국자기학회 학술연구발표회 논문개요집

2010 .12

Inductively Coupled Plasma Reactive Ion Etching of MgO Thin Films Using a CH₄/Ar Plasma

Hwa Won Lee ,  Eun Ho Kim ,  Tae Young Lee 외 1명

한국진공학회 학술발표회초록집

2011 .02

Si Fin etching using Cl₂/Ar Sync, Asynchronized Pulsed Inductively Coupled Plasmas

김희주 ,  김교운 ,  홍종우 외 2명

한국진공학회 학술발표회초록집

2020 .08

Silicon trench etching using inductively coupled Cl₂/ O₂ and Cl₂/ N₂ plasmas

Hyeon-Soo Kim ,  Young-Jun Lee ,  Geun-Young Yeom

Journal of Korean Vacuum Science & Technology

1998 .10

Cl₂ - based dry etching of GaN and InGaN using inductively coupled plasma : the effect of gas additives

이지면 ,  박성주

한국진공학회 학술발표회초록집

1999 .02

Inductively coupled plasma etching of chemical vapor deposition amorphous carbon in O₂/N₂/Ar chemistries

H.J. Lee ,  Y.R. Pa ,  k 외 6명

한국진공학회 학술발표회초록집

2008 .08

High density plasma etching of MgO thin films in Cl₂/Ar gases

Y. B. Xiao ,  E. H. Kim ,  S. M. Kong 외 1명

한국진공학회 학술발표회초록집

2010 .02

Etch Characteristics of MgO Thin Films in Cl2/Ar, CH3OH/Ar, and CH4/Ar Plasmas

Il Hoon Lee ,  Tea Young Lee ,  Chee Won Chung

한국진공학회 학술발표회초록집

2013 .02

Dry etching of Al₂O₃ thin films in inductively coupled plasma system

Seok SON ,  Young Hee JOO ,  Chang Il KIM

한국진공학회 학술발표회초록집

2016 .08

Inductively Coupled Plasma의 Numerical Simulation

주정훈

한국진공학회 학술발표회초록집

1998 .07

Characterization of inductively coupled Ar/CH4 plasma using tuned single langmuir probe and fluid simulation

차주홍 ,  한문기 ,  김동현 외 2명

한국진공학회 학술발표회초록집

2015 .08

Dry etching of SiC in inductively coupled $SF_6/O_2$ Plasma

Yim ,  Jeong-Hyuk ,  Lee 외 13명

한국결정학회 학술연구발표회

2007 .01

Etching properties of titanium nitride thin films in a O₂/Cl₂/Ar plasma

Wang YIYU ,  Young-Hee JOO ,  Chang-Il KIM

한국진공학회 학술발표회초록집

2016 .08

Etch Characteristics of FePt Magnetic Thin Films Using Inductively Coupled Plasma Reactive Ion Etching

Eun Ho Kim ,  Yu Bin Xiao ,  Hwa Won Lee 외 1명

한국자기학회 학술연구발표회 논문개요집

2010 .12

Effects of pulsed inductively coupled Cl₂/Ar plasma for the etching of Si nanostructure

신예지 ,  김교운 ,  김희주 외 4명

한국진공학회 학술발표회초록집

2020 .02

Analysis of chemical reactions of CF₄ and C₄F₈ for inductively coupled plasma based on plasma parameters

J. J. Lee ,  S. J. Kim ,  Y. S. Lee 외 2명

한국진공학회 학술발표회초록집

2019 .08

Selective etching of Mo/HfO₂ in inductively coupled Cl₂/O₂ plasmas for gate stack patterning

H.Y. Jung ,  B.S. Kwon ,  H.J. Lee 외 3명

한국진공학회 학술발표회초록집

2008 .02

Plasma parameters variation in O₂ / He, Ar, Xe inductively coupled plasma as a function of mixing ratio

배근희 ,  유신재 ,  엄환섭 외 1명

한국진공학회 학술발표회초록집

2001 .07

Two - dimensional simulation of inductively coupled large - area plasma source

S. E. Pa ,  k ,  J. K. Lee 외 2명

한국진공학회 학술발표회초록집

2002 .02