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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국진공학회(ASCT) Journal of Korean Vacuum Science & Technology Journal of Korean Vacuum Science & Technology Vol.1 No.1
- 발행연도
- 1997.6
- 수록면
- 24 - 29 (6page)
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초록· 키워드
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Surface morphologies and fundamental characteristics of molybdenum nitride films deposited by reactive dc magnetron sputtering were studied for application to Cu diffusion barrier. A phase transformation from Mo to γ-Mo₂N was observed at the N₂ gas flow ratios (N₂/(Ar+N₂)) equal to and larger than 0.2, whereas a second phase transformation to γ-MoN phase at 0.5 N₂ flow ratio. With the variation of the N₂ ratio the surface morphologies of the films were generally smooth except the cases of 0.2 and 0.3 N₂ gas ratios, where build-up of film stresses occurred. γ-Mo₂N film was found to crystallize at the deposition temperature of 400℃. The surfaces of γ-Mo₂N films deposited up to 400℃ were smooth, but the film deposited at 500℃ had very rough surface morphology. It seems that this was due to the building-up of thermal stresses at the high deposition temperature, which might lead to hillock formation.
목차
Abstract
Ⅰ. Introduction
Ⅱ. Experimental
Ⅲ. Results and Discussion
Ⅳ. Conclusions
References
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