지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
커뮤니티
연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
이용수
등록된 정보가 없습니다.
논문 유사도에 따라 DBpia 가 추천하는 논문입니다. 함께 보면 좋을 연관 논문을 확인해보세요!
Cl2/BCl3/Ar 플라즈마에서 반응성 이온들에 의해 식각된 ZnO 박막 표면 연구
전기전자재료학회논문지
2010 .01
Dry Etching Characteristics of ZnO Thin Films for the Optoelectronic Device by Using Inductively Coupled Plasma
Transactions on Electrical and Electronic Materials
2012 .01
Damage on the Surface of Zinc Oxide Thin Films Etched in Cl-based Gas Chemistry
Transactions on Electrical and Electronic Materials
2011 .01
BCl₃/Ar 유도 결합 플라즈마를 이용한 ZnO 박막의 식각 특성
전기학회논문지
2007 .03
BCl₃/Ar 플라즈마에 Cl₂ 가스 첨가에 따른 TiN 박막의 식각 특성
전기전자재료학회논문지
2008 .01
Cl2/Ar 플라즈마를 이용한 Al2O3 박막의 식각
전기전자재료학회논문지
2009 .01
Dry Etching of ITO Thin Films by the Addition of Gases in Cl2/BCl3 Inductivity Coupled Plasma
Transactions on Electrical and Electronic Materials
2012 .01
The Dry Etching Properties on TiN Thin Film Using an N_2/BCl_3/Ar Inductively Coupled Plasma
Transactions on Electrical and Electronic Materials
2011 .01
Dry etching of ZnO thin film using a $CF_4$ mixed by Ar
한국정보디스플레이학회 International Meeting
2009 .01
Optimized Process Analysis of SiO₂ etch using CFD Simulation
대한전자공학회 학술대회
2017 .01
BCl₃/Cl₂/Ar 플라즈마에서의 Na0.5K0.5NbO₃ 박막의 표면반응
한국표면공학회지
2008 .12
Inductively coupled plasma reactive ion etching of ZnO using $C_2F_6$ and $BCl_3-based$ gas Plasmas
한국재료학회 학술발표대회
2006 .01
The Dry Etching Properties of TaN Thin Film Using Inductively Coupled Plasma
Transactions on Electrical and Electronic Materials
2012 .01
Dry Etching of Al2O3 Thin Films in O2/BCl3/Ar Inductively Coupled Plasma
Transactions on Electrical and Electronic Materials
2010 .01
Etch Properties of HfO2 Thin Films using CH4/Ar Inductively Coupled Plasma
Transactions on Electrical and Electronic Materials
2007 .01
Etching Characteristics of HfAlO3 Thin Films Using an Cl2/BCl3/Ar Inductively Coupled Plasma
Transactions on Electrical and Electronic Materials
2010 .01
Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma
Transactions on Electrical and Electronic Materials
2013 .01
Dry Etching Characteristics of Zinc Oxide Thin Films in Cl_2-Based Plasma
Transactions on Electrical and Electronic Materials
2011 .01
The Use of Inductively Coupled CF4/Ar Plasma to Improve the Etch Rate of ZrO2 Thin Films
Transactions on Electrical and Electronic Materials
2013 .01
Surface Etching of TiO2 Thin Films Using High Density Cl2/Ar Plasma
Transactions on Electrical and Electronic Materials
2015 .01
0