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논문 기본 정보

자료유형
학술저널
저자정보
Junsung Park (Gwangju Institute of Science and Technology) Sung-Min Hong (Gwangju Institute of Science and Technology)
저널정보
대한전자공학회 JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE Journal of Semiconductor Technology and Science Vol.19 No.4
발행연도
2019.8
수록면
413 - 425 (13page)
DOI
10.5573/JSTS.2019.19.4.413

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초록· 키워드

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The β -Ga₂O₃ (beta-gallium oxide) is one of the most promising candidate materials for the future power and RF (radio frequency) devices. The Al₂O₃ (aluminum oxide) is widely adopted as the gate dielectric layer, which is mandatory for developing the Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET) based on Ga₂O₃. Therefore, the theoretical investigation on the properties of the Al₂O₃/ β -Ga O interface is required. We have generated several atomistic models for the Al₂O₃ / β -Ga₂O₃ interface, whose structural parameters are consistent with the experimental findings. From the electronic band structure based on the density-functional theory (DFT) calculation, it is confirmed that the generated interface structures are physically stable. The band offsets between the Ga₂O₃ channel and the Al₂O₃ dielectric layer are calculated for various interface structures. For both the conduction band and the valence band, the Al₂O₃ / β -Ga₂O₃ interface provides sufficiently large band offsets, which makes it attractive for the MOSFET application. The point defects in the interface structure play a critical role in determining the device characteristics. The formation energies and transition levels of various point defects are calculated by using the DFT. It is found that the Ga-, O-, and Al- vacancies have the energy levels close to the conduction band minimum. It is expected that those vacancy defects act as the electron traps at the interface.

목차

Abstract
Ⅰ. INTRODUCTION
Ⅱ. Al₂O₃/Ga₂O₃ INTERFACE
Ⅲ. DEFECT ANALYSIS
Ⅳ. CONCLUSIONS
REFERENCES

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UCI(KEPA) : I410-ECN-0101-2019-569-000961792