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논문 유사도에 따라 DBpia 가 추천하는 논문입니다. 함께 보면 좋을 연관 논문을 확인해보세요!
Infinitely high selectivity etching of SnO2 binary mask in the new absorber material for EUVL using inductively coupled plasma
한국진공학회 학술발표회초록집
2011 .02
Infinitely high selective etching of ITO binary mask structure for extreme ultraviolet lithography (EUVL)
한국진공학회 학술발표회초록집
2009 .02
Infinitely high selective etching of ITO to Ru in ITO binary mask structure for extreme ultraviolet lithography (EUVL) in inductively coupled Cl₂/Arplasmas
한국진공학회 학술발표회초록집
2009 .08
Dry etching of Al₂O3 thin films in inductively coupled plasma system
한국진공학회 학술발표회초록집
2016 .08
Inductively Coupled Plasma의 Numerical Simulation
한국진공학회 학술발표회초록집
1998 .07
Dry etching of SiC in inductively coupled $SF_6/O_2$ Plasma
한국결정학회 학술연구발표회
2007 .01
Analysis of chemical reactions of CF₄ and C₄F8 for inductively coupled plasma based on plasma parameters
한국진공학회 학술발표회초록집
2019 .08
Etch Characteristics of FePt Magnetic Thin Films Using Inductively Coupled Plasma Reactive Ion Etching
한국자기학회 학술연구발표회 논문개요집
2010 .12
Two - dimensional simulation of inductively coupled large - area plasma source
한국진공학회 학술발표회초록집
2002 .02
Numerical modeling of Si/SiO₂ etching with inductively coupled CF4 plasma
한국진공학회 학술발표회초록집
2010 .08
Etching characteristics of Ta and TaN using Cl2 / Ar inductively coupled plasma
한국진공학회 학술발표회초록집
2004 .08
Experimental investigation on plasma density distribution at a wafer-level in an inductively coupled plasma using multiple passive resonant antennas
한국진공학회 학술발표회초록집
2020 .08
Etch Characteristics of IrMn Thin Films Using an Inductively Coupled Plasma of CH₃OH/Ar
한국자기학회 학술연구발표회 논문개요집
2010 .12
Inductively Coupled Plasma 방전의 Global Modelling 과 Simulation
한국진공학회 학술발표회초록집
1997 .07
Si Fin etching using Cl₂/Ar Sync, Asynchronized Pulsed Inductively Coupled Plasmas
한국진공학회 학술발표회초록집
2020 .08
Interpretation of current decrease during E - H mode transition in a cylindrical inductively coupled plasma
한국진공학회 학술발표회초록집
2018 .08
Research on parallelization mechanism of inductively coupled plasma for large area plasma source
한국진공학회 학술발표회초록집
2016 .02
Inductively coupled plasma etching of chemical vapor deposition amorphous carbon in O₂/N₂/Ar chemistries
한국진공학회 학술발표회초록집
2008 .08
Electrical Characteristics of Inductively Coupled Plasma Sources using Magnetic Resonance Wireless Power Transmission System
한국진공학회 학술발표회초록집
2020 .08
Silicon oxide etching studies in inductively coupled fluorocarbon plasmas
한국진공학회 학술발표회초록집
2017 .02
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