Characterization of ALD (HfO2)x(SiO2)1-x dielectrics on p-Si(100)

H. Jin ,  H. J. Kang ,  M.-H. Cho

한국진공학회 학술발표회초록집

2006 .08

Initial reactions of Al₂O₃ films on Si(001) grown by atomic layer deposition : in-situ synchrotron radiation photoemission spectroscopy

김석환 ,  박호영 ,  백재윤 외 7명

한국진공학회 학술발표회초록집

2007 .08

Photoelectron spectroscopy를 이용한 Mg / SI(111)7×7 계에 대한 연구

김정선 ,  안기석 ,  박래준 외 1명

한국진공학회 학술발표회초록집

1994 .02

Experimental Techniques or Surface Science with Synchrotron Radiation

R.L. Johnson ,  O. Bunk ,  G. Falkenbe 외 7명

한국진공학회 학술발표회초록집

1998 .02

Some New Directions in Surface and Interface Science Studies Using Synchrotron Radiation

Cha ,  les S. Fadley

한국진공학회 학술발표회초록집

2001 .02

ALD growth of HfO₂ thin films using Hf(mp)₄ and water

조원태 ,  장홍석 ,  양택승 외 7명

한국진공학회 학술발표회초록집

2004 .08

Phase transition at low temperature and photoelectron spectroscopy of the Pb / Si(110) - 1x1 surface

김용기 ,  김남홍 ,  김윤희 외 8명

한국진공학회 학술발표회초록집

2003 .02

Biological Application of Synchrotron Radiation

Han ,  Sung-Sik ,  Lim 외 3명

한국응용곤충학회 학술발표회

2002 .01

Characteristics of low-temperature at 80°C HfO2 deposited by ALD (Atomic Layer Deposition) and electrical properties of NMOS capacitor

Kyoung-Mun Kim ,  Soon-Gil Yoon ,  Nak-Kwan Chung

한국진공학회 학술발표회초록집

2019 .08

Effects of N₂ Anneal on Electrical Properties of HfO₂ Film on Si Substrate

Soonkon Kim ,  Byoungdeog Choi

한국진공학회 학술발표회초록집

2018 .02

Influence of O₂ Anneal on the Electrical Properties of HfO₂ thin Film on Si Substrate

Soonkon Kim ,  Byoungdeog Choi

한국진공학회 학술발표회초록집

2018 .02

In-situ Synchrotron Radiation Photoemission Spectroscopy Study of Properties Variation of Ta2O5 Film during the Atomic Layer Deposition

Seung Youb Lee ,  Cheolho Jeon ,  Woosung Jung 외 5명

한국진공학회 학술발표회초록집

2013 .08

1B2)The Third-generation Synchrotron Radiation Technique for Single Particle Analysis

Chang-Jin Ma

한국대기환경학회 학술대회논문집

2003 .05

Interfacial Studies of Energy Materials Using Synchrotron X-ray Spectroscopy

Yan-Gu Lin

한국진공학회 학술발표회초록집

2018 .08

Interphase formation in solid-state batteries studied in situ by photoelectron spectroscopy

Thomas LEICHTWEISS ,  Sebastian WENZEL ,  Joachim SANN 외 2명

한국진공학회 학술발표회초록집

2016 .08

범밀도함수론을 이용한 정방정계-HfO₂/Si의 계면 층 구조 연구

김대희 ,  서화일 ,  김영철

Applied Science and Convergence Technology

2009 .01

Influence of O₂ Annealing on Electrical Characteristics of Atomic Layer Deposited HfO₂ thin Films on Si Substrate

Soonkon Kim ,  Byoungdeog Choi

한국진공학회 학술발표회초록집

2018 .08

Development of analysis model for x-ray photoelectron spectroscopy spectra based on machine learning

MinA Lim ,  SooYeon Lim ,  Byeong-hyeon Lee 외 3명

한국진공학회 학술발표회초록집

2020 .08

Development of two photon photoelectron yield spectroscopy

Takuya HOSOKAI ,  Hi ,  oyuki MATSUZAKI 외 3명

한국진공학회 학술발표회초록집

2016 .08

Effect of Post Deposition Annealing in N₂ Ambient on Electrical Properties of Atomic Layer Deposited HfO₂ Films on Si

Soonkon Kim ,  Byoungdeog Choi

한국진공학회 학술발표회초록집

2018 .08