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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국전기전자재료학회 Transactions on Electrical and Electronic Materials Transactions on Electrical and Electronic Materials 제20권 제6호
- 발행연도
- 2019.1
- 수록면
- 554 - 557 (4page)
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Utilizing amorphous semiconductor materials of Si–In–Zn–O (SIZO) and metal Ag, oxide–metal–oxide (OMO) low-emissivity (low-E) coatings were deposited onto fl exible substrates at room temperature. It is known that optical and electrical properties of OMO multilayers are very sensitive to the thickness of middle Ag layer. Experimentally, by optimizing the thickness of middle Ag layers, it was found that 11 nm Ag thickness showed excellent properties in terms of transmittance and electrical resistance based on fi gure of merit. Under optimized conditions, OMO multilayer shows high transmittance of about 90% in visible region, and high refl ectivity of above 90% at 2200 nm. Also, fl exibility and adhesion properties were improved in bending test. Experimental results indicated that SIZO–Ag–SIZO is promising for high performance and cost-effective low-E coating fabrication.
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