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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 2007.12
- 수록면
- 149 - 151 (3page)
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The AlCrN films were grown by RF reactive sputtering method under the selected conditions. The Cr concentration was varied by the number of Cr pieces placed on the Al target. The sample quality has been studied by XRD, Auger spectroscopy, optical absorption and electrical resistant measurements. The XRD and Auger results show that the samples consist of a major phase with the Al<SUB>1-x</SUB>CrxN formula, which has a hexagonal structure, and a few percents at. of oxygen, which may form Al₂O₃. There exist the Cr cluster ... 전체 초록 보기
목차
1. Introduction
2. Experiments
3. Results and Discussion
4. Conclusion
Acknowledgements
References
참고문헌 (8)
참고문헌 신청
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2. [학술지(정기간행물)] - S. J. Pearton / 2003 / Materials Science and Engineering R40, 137-168 (2003) / Materials Science and Engineering
3. [학술지(정기간행물)] - H. Ohno / 1996 / Appl. Phys. Lett. 69, 363 (1996) / Appl. Phys. Lett.
4. [학술지(정기간행물)] - T. Dietl / 2000 / Science 287, 1019 (2000) / Science
5. [학술지(정기간행물)] - F. Hasegawa / 1987 / Jpn. Appl. Phys. 26, 2418 (1987) / Jpn. Appl. Phys.
2. [학술지(정기간행물)] - S. J. Pearton / 2003 / Materials Science and Engineering R40, 137-168 (2003) / Materials Science and Engineering
3. [학술지(정기간행물)] - H. Ohno / 1996 / Appl. Phys. Lett. 69, 363 (1996) / Appl. Phys. Lett.
4. [학술지(정기간행물)] - T. Dietl / 2000 / Science 287, 1019 (2000) / Science
5. [학술지(정기간행물)] - F. Hasegawa / 1987 / Jpn. Appl. Phys. 26, 2418 (1987) / Jpn. Appl. Phys.
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