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자료유형
학술저널
저자정보
저널정보
대한기계학회 Journal of Mechanical Science and Technology Journal of Mechanical Science and Technology Vol.20 No.9
발행연도
2006.9
수록면
1,492 - 1,501 (10page)

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초록· 키워드

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A transportation system of single wafer has been developed to be applied to semiconductor manufacturing process of the next generation. In this study, the experimental apparatus consists of two kinds of track, one is for propelling a wafer, so called control track, the other is for generating an air film to transfer a wafer, so called transfer track. The wafer transportation speed has been evaluated by the numerical and the experimental methods for three types of nozzle position array (i.e., the front-, face- and rear-array) in an air levitation system. Test facility for 300 mm wafer has been equipped with two control tracks and one transfer track of 1500 mm length from the starting point to the stopping point. From the present results, it is found that the experimental values of the wafer transportation speed are well in agreement with the computed ones. Namely, the computed values of the maximum wafer transportation speed V<SUB>max</SUB> are slightly higher than the experimental ones by about 15~20%. The disparities in V<SUB>max</SUB> between the numerical and the experimental results become smaller as the air velocity increases. Also, at the same air flow rate, the order of wafer transportation speeds is: V<SUB>max</SUB> for the front-array > V<SUB>max</SUB> for the face-array >V<SUB>max</SUB> for the rear-array. However, the face-array is rather more stable than any other type of nozzle array to ensure safe transportation of a wafer.

목차

영어 초록
1. Introduction
2. Wafer Propulsion
3. Wafer Transportation Speed
4. Experimental Apparatus and Procedure
5. Results and Discussions
6. Conclusions
Acknowledgements
References

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