Quantitative analysis of silicone fluid by inductively coupled plasma-optical emission spectroscopy

Mi ,  i ,  Kwon

한국분석과학회 학술대회

2016 .11

Dry etching of SiC in inductively coupled $SF_6/O_2$ Plasma

Yim ,  Jeong-Hyuk ,  Lee 외 13명

한국결정학회 학술연구발표회

2007 .01

Advanced Dry Etching of GaAs in High - Density Planar Inductively Coupled BCl3 Plasmas

임완태 ,  백인규 ,  정필구 외 6명

한국진공학회 학술발표회초록집

2003 .02

Study on the electrical and optical diagnosis of electron temperatures according to conditions of plasma emission light intensity in inductively coupled plasma

Ye-Seul LEE ,  Jin-Woo CHOI ,  Tae-Hoon JO 외 3명

한국진공학회 학술발표회초록집

2016 .08

Etching characteristics of ZnO thin films using inductively coupled BCl₃ / Ar and Cl₂ / Ar plasma

S-W. Na ,  M-H. Shin ,  Y-M. Chung 외 4명

한국진공학회 학술발표회초록집

2004 .08

Dry etching of Al₂O₃ thin films in inductively coupled plasma system

Seok SON ,  Young Hee JOO ,  Chang Il KIM

한국진공학회 학술발표회초록집

2016 .08

Inductively Coupled Plasma의 Numerical Simulation

주정훈

한국진공학회 학술발표회초록집

1998 .07

Experimental investigation on plasma density distribution at a wafer-level in an inductively coupled plasma using multiple passive resonant antennas

홍영훈 ,  김주호 ,  이무현 외 2명

한국진공학회 학술발표회초록집

2020 .08

Sensitivity Enhancement of Fault Detection in Plasma Etching Processes using Optical Emission Spectroscopy with Multivariate Analysis

Hakseung Lee ,  Haegyu Jang ,  Honyoung Lee 외 1명

한국진공학회 학술발표회초록집

2015 .02

RF Plasma Etching Endpoint Detection of Dielectric layers Using Optical Emission Spectroscopy with modified K-means Cluster Analysis

Hak-seung Lee ,  Haegyu Jang ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2014 .08

Real-time Advanced Process Control Technology Using Optical Emission Spectroscopy in Dry Etching Process

방진영 ,  김태랑 ,  전중현

한국진공학회 학술발표회초록집

2014 .08

Modified Principal Component Analysis for In-situ Endpoint Detection of Dielectric Layers Etching Using Plasma Impedance Monitoring and Self Plasma Optical Emission Spectroscopy

Haegyu Jang ,  Sanghyuk Choi ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2012 .02

Analysis of chemical reactions of CF₄ and C₄F₈ for inductively coupled plasma based on plasma parameters

J. J. Lee ,  S. J. Kim ,  Y. S. Lee 외 2명

한국진공학회 학술발표회초록집

2019 .08

Etch Characteristics of FePt Magnetic Thin Films Using Inductively Coupled Plasma Reactive Ion Etching

Eun Ho Kim ,  Yu Bin Xiao ,  Hwa Won Lee 외 1명

한국자기학회 학술연구발표회 논문개요집

2010 .12

Applications of fluid based plasma simulation : dry etch

주정훈

한국진공학회 학술발표회초록집

2018 .02

Cl₂ - based dry etching of GaN and InGaN using inductively coupled plasma : the effect of gas additives

이지면 ,  박성주

한국진공학회 학술발표회초록집

1999 .02

Two - dimensional simulation of inductively coupled large - area plasma source

S. E. Pa ,  k ,  J. K. Lee 외 2명

한국진공학회 학술발표회초록집

2002 .02

Catalytic Effects of Ar addition for High - rate Dry etching of Ga - based compound semiconductors in High - Density Planar Inductively Coupled BCl3 / Ar Plasmas

이제원 ,  임완태 ,  백인규 외 6명

한국진공학회 학술발표회초록집

2003 .02

Numerical modeling of Si/SiO₂ etching with inductively coupled CF4 plasma

양원균 ,  주정훈

한국진공학회 학술발표회초록집

2010 .08

Chamber Monitoring with Residual Gas Analysis with Self-Plasma Optical Emission Spectroscopy

장해규 ,  이학승 ,  박정건 외 1명

한국진공학회 학술발표회초록집

2014 .02