Etching characteristics of Ta and TaN using Cl2 / Ar inductively coupled plasma

M. H. Shin ,  S. W. Na ,  N.-E. Lee 외 1명

한국진공학회 학술발표회초록집

2004 .08

Silicon trench etching using inductively coupled Cl₂/ O₂ and Cl₂/ N₂ plasmas

Hyeon-Soo Kim ,  Young-Jun Lee ,  Geun-Young Yeom

Journal of Korean Vacuum Science & Technology

1998 .10

Cl₂ - based dry etching of GaN and InGaN using inductively coupled plasma : the effect of gas additives

이지면 ,  박성주

한국진공학회 학술발표회초록집

1999 .02

Dry etching of Al₂O₃ thin films in inductively coupled plasma system

Seok SON ,  Young Hee JOO ,  Chang Il KIM

한국진공학회 학술발표회초록집

2016 .08

Inductively Coupled Plasma의 Numerical Simulation

주정훈

한국진공학회 학술발표회초록집

1998 .07

MoS2 layer etching using CF4 plasma and H2S plasma treatment

양경채 ,  박성우 ,  김경남 외 1명

한국진공학회 학술발표회초록집

2016 .02

Dry etching of SiC in inductively coupled $SF_6/O_2$ Plasma

Yim ,  Jeong-Hyuk ,  Lee 외 13명

한국결정학회 학술연구발표회

2007 .01

Si Fin etching using Cl₂/Ar Sync, Asynchronized Pulsed Inductively Coupled Plasmas

김희주 ,  김교운 ,  홍종우 외 2명

한국진공학회 학술발표회초록집

2020 .08

Etching characteristics of ZnO thin films using inductively coupled BCl₃ / Ar and Cl₂ / Ar plasma

S-W. Na ,  M-H. Shin ,  Y-M. Chung 외 4명

한국진공학회 학술발표회초록집

2004 .08

Analysis of chemical reactions of CF₄ and C₄F₈ for inductively coupled plasma based on plasma parameters

J. J. Lee ,  S. J. Kim ,  Y. S. Lee 외 2명

한국진공학회 학술발표회초록집

2019 .08

Etch Characteristics of FePt Magnetic Thin Films Using Inductively Coupled Plasma Reactive Ion Etching

Eun Ho Kim ,  Yu Bin Xiao ,  Hwa Won Lee 외 1명

한국자기학회 학술연구발표회 논문개요집

2010 .12

Two - dimensional simulation of inductively coupled large - area plasma source

S. E. Pa ,  k ,  J. K. Lee 외 2명

한국진공학회 학술발표회초록집

2002 .02

Numerical modeling of Si/SiO₂ etching with inductively coupled CF4 plasma

양원균 ,  주정훈

한국진공학회 학술발표회초록집

2010 .08

A study of MOS characteristics of reoxidized HfO₂ thin film for gate oxide applications

Dongwon Lee ,  Hyo-Jick Choi ,  Seok-Woo Nam 외 2명

한국진공학회 학술발표회초록집

2001 .07

Effects of pulsed inductively coupled Cl₂/Ar plasma for the etching of Si nanostructure

신예지 ,  김교운 ,  김희주 외 4명

한국진공학회 학술발표회초록집

2020 .02

Experimental investigation on plasma density distribution at a wafer-level in an inductively coupled plasma using multiple passive resonant antennas

홍영훈 ,  김주호 ,  이무현 외 2명

한국진공학회 학술발표회초록집

2020 .08

Etch Characteristics of IrMn Thin Films Using an Inductively Coupled Plasma of CH₃OH/Ar

Y. B. Xiao ,  E. H. Kim ,  S .M. Kong 외 1명

한국자기학회 학술연구발표회 논문개요집

2010 .12

Inductively Coupled Plasma 방전의 Global Modelling 과 Simulation

유광일 ,  윤남석 ,  황순모

한국진공학회 학술발표회초록집

1997 .07

Interpretation of current decrease during E - H mode transition in a cylindrical inductively coupled plasma

Jun-Hyeon Moon ,  Ho-Jun Moon ,  Chin-Wook Chung

한국진공학회 학술발표회초록집

2018 .08

Research on parallelization mechanism of inductively coupled plasma for large area plasma source

이장재 ,  김시준 ,  김광기 외 5명

한국진공학회 학술발표회초록집

2016 .02