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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국정보통신학회JICCE Journal of information and communication convergence engineering Journal of information and communication convergence engineering Vol.13 No.1
- 발행연도
- 2015.3
- 수록면
- 56 - 61 (6page)
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초록· 키워드
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The demand for high-aspect-ratio structures has been increasing in the field of semiconductors and other applications. Here, we present the commercially available negative-tone SU-8 as a potential resist that can be used for direct patterning of highaspect-ratio structures at the submicron scale and the nanoscale. Such resist patterns can be used as polymeric molds to create high-aspect-ratio metallic submicron and nanoscale structures by using electroplating. Compared with poly (methyl methacrylate) (PMMA), we found that the negative tone resist required an exposure dose that was less than that of PMMA of equal thickness by a factor of 100?150. Patterning of up to 4:1 aspect ratio SU-8 structures with a minimum feature size of 500 nm was demonstrated. In addition, nanoimprint lithography was studied to further extend the aspect ratio to realize a minimum feature size of less than 10 nm with an extremely high aspect ratio in the negative resist.
목차
Abstract
Ⅰ. INTRODUCTION
Ⅱ. ELECTRON BEAM LITHOGRAPHY ON SU-8
Ⅲ. NANOIMPRINT LITHOGRAPHY ON SU-8
Ⅳ. CONCLUSIONS
REFERENCES
참고문헌 (10)
참고문헌 신청
1. [학술지(정기간행물)] - D. Hisamoto / 2000 / FinFET : a selfaligned double-gate MOSFET scalable to 20 nm / IEEE Transactions on Electron Devices 47 (12) : 2320 ~ 2325
2. [학술지(정기간행물)] - X. L. Feng / 2007 / Very high frequency silicon nanowire electromechanical resonators / Nano Letters 7 (7) : 1953 ~ 1959
3. [학술지(정기간행물)] - C. Vieu / 2000 / Electron beam lithography : resolution limits and applications / Applied Surface Science 164 (1) : 111 ~ 117
4. [학술지(정기간행물)] - D. P. Stumbo / 1993 / Ion exposure characterization of a chemically amplified epoxy resist / Journal of Vacuum Science &Technology B 11 (6) : 2432 ~ 2435
5. [학술지(정기간행물)] - J. A. Van Kan / 2002 / Nickel and copper electroplating of proton beam micromachined SU-8 resist / Microsystem Technologies 8 (6) : 383 ~ 386
2. [학술지(정기간행물)] - X. L. Feng / 2007 / Very high frequency silicon nanowire electromechanical resonators / Nano Letters 7 (7) : 1953 ~ 1959
3. [학술지(정기간행물)] - C. Vieu / 2000 / Electron beam lithography : resolution limits and applications / Applied Surface Science 164 (1) : 111 ~ 117
4. [학술지(정기간행물)] - D. P. Stumbo / 1993 / Ion exposure characterization of a chemically amplified epoxy resist / Journal of Vacuum Science &Technology B 11 (6) : 2432 ~ 2435
5. [학술지(정기간행물)] - J. A. Van Kan / 2002 / Nickel and copper electroplating of proton beam micromachined SU-8 resist / Microsystem Technologies 8 (6) : 383 ~ 386
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