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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국전기전자재료학회 Transactions on Electrical and Electronic Materials Transactions on Electrical and Electronic Materials 제17권 제2호
- 발행연도
- 2016.1
- 수록면
- 121 - 124 (4page)
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ZnSnO3 (ZTO)/Ag/ ZnSnO3 (ZTO) trilayer films were prepared on glass substrates by radio frequency (RF) and direct current (DC) magnetron sputtering. The electrical resistivity and optical transmittance of he films were investigated as a function of the Ag interlayer thickness. ZTO films with a 15 nm thick Ag interlayer show the highest average visible transmittance (83.2%) in the visible range. In this study, the highest figure of merit (2.1×10-2 Ω cm) is obtained with the ZTO 50 nm/Ag 15 nm/ZTO 50 nm films. The enhanced optical and electrical properties of ZTO films with a 15 nm thick Ag interlayer are attributed to the crystallization of the Ag interlayer, as supported by the distinct XRD pattern of the Ag (111) peaks. From the observed results, higher optical and electrical performance of the ZTO film with a 15 nm thick Ag interlayer seems to make a promising alternative to conventional transparent conductive ITO films.
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참고문헌 (10)
참고문헌 신청
Daeil Kim / 2006 / Low temperature deposition of ITO on organic films by using negative ion assisted dual magnetron sputtering system / Vacuum 81(3):279~284
Kento Hirohata / 2010 / Al-doped ZnO (AZO) films deposited by reactive sputtering with unipolar-pulsing and plasma-emission control systems / Thin Solid Films 518(11):2980~2983
Daeil Kim / 2014 / Improved electrical and optical properties of GZO films with a thin TiO2 buffer layer deposited by RF magnetron sputtering / Ceramics International 40(1):1457~1460
Takahiro Yamada / 2009 / Effect of thermal annealing on electrical properties of transparent conductive Ga-doped ZnO films prepared by ion-plating using direct-current arc discharge / Thin Solid Films 517(10):3134~3137
Tae Young Ma / 2013 / Optical and electrical properties of Mg-doped zinc tin oxide films prepared by radio frequency magnetron sputtering / Applied Surface Science 286:131~136
Kento Hirohata / 2010 / Al-doped ZnO (AZO) films deposited by reactive sputtering with unipolar-pulsing and plasma-emission control systems / Thin Solid Films 518(11):2980~2983
Daeil Kim / 2014 / Improved electrical and optical properties of GZO films with a thin TiO2 buffer layer deposited by RF magnetron sputtering / Ceramics International 40(1):1457~1460
Takahiro Yamada / 2009 / Effect of thermal annealing on electrical properties of transparent conductive Ga-doped ZnO films prepared by ion-plating using direct-current arc discharge / Thin Solid Films 517(10):3134~3137
Tae Young Ma / 2013 / Optical and electrical properties of Mg-doped zinc tin oxide films prepared by radio frequency magnetron sputtering / Applied Surface Science 286:131~136
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