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학술저널
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한국전기전자재료학회 Transactions on Electrical and Electronic Materials Transactions on Electrical and Electronic Materials 제16권 제2호
발행연도
2015.1
수록면
99 - 102 (4page)

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Thin film transistors (TFTs) with amorphous 2 wt% silicon-doped zinc tin oxide (a-2SZTO) channel layer werefabricated using an RF magnetron sputtering system, and the effect of post-annealing treatment time on thestructural and electrical properties of a-2SZTO systems was investigated. It is well known that Si can effectively reducethe generation of oxygen vacancies. However, it is interesting to note that prolonged annealing could have a badeffect on the roughness of a-2SZTO systems, since the roughness of a-2SZTO thin films increases in proportion to thethermal annealing treatment time. Thermal annealing can control the electrical characteristics of amorphous oxidesemiconductor (AOS) TFTs. It was observed herein that prolonged annealing treatment can cause bumpy roughness,which led to increase of the contact resistance between the electrode and channel. Thus, it was confirmed thatdeterioration of the electrical characteristics could occur due to prolonged annealing. The longer annealing time alsodecreased the field effect mobility. The a-2SZTO TFTs annealed at 500℃ for 2 hours displayed the mobility of 2.17 cm2/Vs. As the electrical characteristics of a-2SZTO annealed at a fixed temperature for long periods were deteriorated,careful optimization of the annealing conditions for a-2SZTO, in terms of time, should be carried out to achieve betterperformance.

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