Plasma Optical Signal Analysis for SiNx Plasma Enhanced Chemical Vapor Deposition Processes

Yooncheol Shin ,  Sun Jung Kim ,  Sangin Lee 외 1명

한국진공학회 학술발표회초록집

2019 .08

Enhanced Anti-reflective Effect of SiN_x/SiO_x/InSnO Multi-layers using Plasma Enhanced Chemical Vapor Deposition System with Hybrid Plasma Source

Min-Jun Choi ,  O Dae Kwon ,  Sang Dae Choi 외 3명

Applied Science and Convergence Technology

2016 .07

Synthesis and Characterization of ThMn₁₂-type by nitridation reaction

Kang-Hyuk Lee ,  Sang-Im Yoo

한국자기학회 학술연구발표회 논문개요집

2019 .11

Structural evolution and highly active reaction in direct plasma process on 4H-SiC

김대경 ,  조만호

한국진공학회 학술발표회초록집

2017 .02

VHF-PECVD for a-Si:H and a-SiN:H Film Deposition

Jin Seok Kim

Applied Science and Convergence Technology

2019 .09

Growth and Nitridation of Fe thin films on (0001) Al₂O₃ substrates

Hyeonjun Kong ,  Eunyoung Ahn ,  Yuon-Kyoung Baek 외 6명

한국자기학회 학술연구발표회 논문개요집

2016 .11

Correlation Analysis of Plasma Properties and Film Properties using Optical Emission Spectroscopy in Plasma Enhanced Chemical Vapor Deposition Processes of Silicon Nitride

Seunghun Han ,  Byung hyun Oh ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .08

Structural Evolution and Electrical Properties of Highly Active Plasma Process on 4H-SiC

Dae-Kyoung Kim ,  Mann-Ho Cho

Applied Science and Convergence Technology

2017 .09

Correlation Study between Optical Emission Spectroscopy Signals and Silicon Nitride Film Properties in Plasma Enhanced Chemical Vapor Deposition Processes

Seunghun Han ,  Sun Jung Kim ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .02

Prediction of Silicon Nitride Film Properties by the Analysis of Optical Emission Spectroscopy Signals in Plasma Enhanced Chemical Vapor Deposition Processes

Sun Jung Kim ,  Seunghun Han ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .02

Optimized ultra-thin tunnel oxide layer characteristics by PECVD using N₂O plasma growth for high efficiency n-type Si solar cell

Minhan Jeon ,  Jiyoon Kang ,  Donghyun Oh 외 8명

한국진공학회 학술발표회초록집

2016 .02

Low Temperature PECVD process for SiNx/Organic Multilayer Thin Film Encapsulation

Hyung June Ahn ,  Sang Heon Yong ,  Sun Jung Kim 외 3명

한국진공학회 학술발표회초록집

2017 .02

Structure control of Fe Particles for the Efficient Nitridation

김수경 ,  이정구 ,  권세훈 외 1명

한국자기학회 학술연구발표회 논문개요집

2016 .11

Low Temperature PECVD for SiOx Thin Film Encapsulation

Hyung June Ahn ,  Sang Heon Yong ,  Sun Jung Kim 외 2명

한국진공학회 학술발표회초록집

2016 .02

N₂O plasma growth ultra-thin tunnel oxide layer passivation by PECVD for high efficiency n-type Si solar cell

Minhan JEON ,  Jiyoon KANG ,  Donghyun OH 외 6명

한국진공학회 학술발표회초록집

2016 .08

Silicon Thin-film Solar Cell Deposited by Using High Working Pressure Plasma-enhanced Chemical Vapor Deposition System

권정대 ,  남기석 ,  김동호

한국진공학회 학술발표회초록집

2015 .02

낮은 GWP를 가진 CxF2xO 을 이용한 SiO2 식각 공정 특성에 관한 연구

탁현우 ,  문룡 ,  성다인 외 3명

한국진공학회 학술발표회초록집

2020 .02

Investigation of In Situ NH₃ and N₂O Plasma Treatment on AlGaN/GaN High Electron Mobility Transistors

Dohyun Kim ,  Hyun-Wook Jung ,  Sung-Jae Chang 외 3명

Applied Science and Convergence Technology

2024 .09

Low-Temperature Synthesis of Wafer Scale WS₂ by PECVD

Kanade Vinit ,  김형우 ,  박근상 외 1명

한국진공학회 학술발표회초록집

2019 .02

Effect of plasma properties on characteristics of silicon nitride film deposited by PECVD process at low temperature

Jeon G. HAN ,  Jun S. LEE ,  Bibhuti B. SAHU 외 3명

한국진공학회 학술발표회초록집

2016 .08