Chamber Monitoring with Residual Gas Analysis with Self-Plasma Optical Emission Spectroscopy

장해규 ,  이학승 ,  박정건 외 1명

한국진공학회 학술발표회초록집

2014 .02

Modified Principal Component Analysis for In-situ Endpoint Detection of Dielectric Layers Etching Using Plasma Impedance Monitoring and Self Plasma Optical Emission Spectroscopy

Haegyu Jang ,  Sanghyuk Choi ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2012 .02

In-situ Endpoint Detection for Dielectric Films Plasma Etching Using Plasma Impedance Monitoring and Self-plasma Optical Emission Spectroscopy with Modified Principal Component Analysis

장해규 ,  채희엽

한국진공학회 학술발표회초록집

2012 .08

Optical emission spectroscopy for atmospheric pressure plasmas : Principles and applications

Se Youn Moon ,  Wonho Choe ,  Dan Bee Kim 외 1명

한국진공학회 학술발표회초록집

2008 .02

Real-Time Small Exposed Area SiO₂ Films Thickness Monitoring in Plasma Etching Using Plasma Impedance Monitoring with Modified Principal Component Analysis

장해규 ,  남재욱 ,  채희엽

한국진공학회 학술발표회초록집

2013 .02

Sensitivity Enhancement of Fault Detection in Plasma Etching Processes using Optical Emission Spectroscopy with Multivariate Analysis

Hakseung Lee ,  Haegyu Jang ,  Honyoung Lee 외 1명

한국진공학회 학술발표회초록집

2015 .02

Plasma Impedance Monitoring with Real-time Cluster Analysis for RF Plasma Etching Endpoint Detection of Dielectric Layers

장해규 ,  채희엽

한국진공학회 학술발표회초록집

2013 .08

Plasma Diagnostics using Optical Emission Spectroscopy on Argon Capacitively Coupled Plasma with Various Line-of-Sight

Jaemin Song ,  Jongsik Kim ,  Dae Chul Kim 외 6명

한국진공학회 학술발표회초록집

2019 .08

Quantitative analysis of silicone fluid by inductively coupled plasma-optical emission spectroscopy

Mi ,  i ,  Kwon

한국분석과학회 학술대회

2016 .11

Correlation Analysis of Plasma Properties and Film Properties using Optical Emission Spectroscopy in Plasma Enhanced Chemical Vapor Deposition Processes of Silicon Nitride

Seunghun Han ,  Byung hyun Oh ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .08

Enhancement of the Virtual Metrology Performance for Plasma-assisted Processes by Using Plasma Information (PI) Parameters

Seolhye Pa ,  k ,  Juyoung Lee 외 5명

한국진공학회 학술발표회초록집

2015 .08

Real-time Advanced Process Control Technology Using Optical Emission Spectroscopy in Dry Etching Process

방진영 ,  김태랑 ,  전중현

한국진공학회 학술발표회초록집

2014 .08

Fault Detection of Plasma Etching Processes with OES and Impedance at CCP Etcher

SangHyuk Choi ,  HaeGyu Jang ,  HeeYeop Chae

한국진공학회 학술발표회초록집

2012 .08

Non-Invasive Plasma Monitoring Tools and Multivariate Analysis Techniques for Sensitivity Improvement

Haegyu Jang ,  Hak-Seung Lee ,  Honyoung Lee 외 1명

Applied Science and Convergence Technology

2014 .11

Oxygen Plasma Characterization Analysis for Plasma Etch Process

Pa ,  k ,  Jin-Su 외 2명

동굴

2007 .01

Prediction of Silicon Nitride Film Properties by the Analysis of Optical Emission Spectroscopy Signals in Plasma Enhanced Chemical Vapor Deposition Processes

Sun Jung Kim ,  Seunghun Han ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .02

Correlation Study between Optical Emission Spectroscopy Signals and Silicon Nitride Film Properties in Plasma Enhanced Chemical Vapor Deposition Processes

Seunghun Han ,  Sun Jung Kim ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2020 .02

다변량 분석기법을 통한 플라즈마 공정 모니터링 기술

장해규 ,  고경범 ,  이호녕 외 1명

진공이야기

2015 .12

RF Plasma Etching Endpoint Detection of Dielectric layers Using Optical Emission Spectroscopy with modified K-means Cluster Analysis

Hak-seung Lee ,  Haegyu Jang ,  Heeyeop Chae

한국진공학회 학술발표회초록집

2014 .08