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학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
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연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국진공학회(ASCT) Applied Science and Convergence Technology Applied Science and Convergence Technology Vol.23 No.6
- 발행연도
- 2014.11
- 수록면
- 328 - 339 (12page)
이용수
초록· 키워드
오류제보하기
In this article, plasma monitoring tools and mulivariate analysis techniques were reviewed. Optical emission spectroscopy was reviewed for a chemical composition analysis tool and RF V-I probe for a physical analysis tool for plasma monitoring. Multivariate analysis techniques are discussed to the sensitivity improvement. Principal component analysis (PCA) is one of the widely adopted multivariate analysis techniques and its application to end-point detection of plasma etching process is discussed.
목차
I. Introduction
II. Optical Emission Spectroscopy (OES)
III. RF Voltage-Current (V-I) Monitoring
IV. Multivariate Analysis Techniques for Enhancing Sensitivity of Plasma Monitoring
V. Conclusions
References
참고문헌 (39)
참고문헌 신청
1. [단행본] - R. Mohan Sankaran / 2012 / Plasma processing of nanomaterials / CRC Press : 1 ~ 54
2. [학술지(정기간행물)] - S. J. Pearton / 2005 / / Plasma Process. Polym 2 : 16 ~
3. [학술지(정기간행물)] - P. Mishra / 2013 / / Superlattice Microst 64 : 399 ~
4. [학술지(정기간행물)] - J. M. Stilahn / 2008 / / Annu. Rev. Anal. Chem 1 : 261 ~
5. [단행본] - M. A. Lieberman / 2005 / Principles of Plasma Discharges and Materials Processing / Wiley-Interscience : 387 ~ 534
2. [학술지(정기간행물)] - S. J. Pearton / 2005 / / Plasma Process. Polym 2 : 16 ~
3. [학술지(정기간행물)] - P. Mishra / 2013 / / Superlattice Microst 64 : 399 ~
4. [학술지(정기간행물)] - J. M. Stilahn / 2008 / / Annu. Rev. Anal. Chem 1 : 261 ~
5. [단행본] - M. A. Lieberman / 2005 / Principles of Plasma Discharges and Materials Processing / Wiley-Interscience : 387 ~ 534
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UCI(KEPA) : I410-ECN-0101-2019-420-001275300