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논문 기본 정보

자료유형
학술저널
저자정보
노영록 (한양대학교) 김종필 (한양대학교) 박진석 (한양대학교)
저널정보
대한전기학회 전기학회논문지 전기학회논문지 제59권 제4호
발행연도
2010.4
수록면
743 - 748 (6page)

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Boron nitride (BN) and carbon nitride (CN) films, which have relatively low work functions and commonly exhibit negative electron affinity behaviors, were coated on carbon nanotubes (CNTs) by magnetron sputtering. The CNTs were directly grown on metal-tip (tungsten, approximately 500nm in diameter at the summit part) substrates by inductively coupled plasma-chemical vapor deposition (ICP-CVD). The variations in the morphology and microstructure of CNTs due to coating of the BN and CN films were analyzed by field-emission scanning electron microscopy (FE-SEM). The energy dispersive x-ray (EDX) spectroscopy and Raman spectroscopy were used to identify the existence of the coated layers (CN and BN) on CNTs. The electron-emission properties of the BN-coated and CN-coated CNT-emitters were characterized using a high-vacuum field emission measurement system, in terms of their maximum emission currents (Imax) at 1kV and turn-on voltage (Von) for approaching 1μA. The results showed that the Imax current was significantly increased and the Von voltage were remarkably reduced by the coating of CN or BN films. The measured values of Imax-Von were as follows; 176μA-500V for the 5nm CN-coated emitter and 289μA-540V for the 2nm BN-coated emitter, respectively, while the Imax-Von of the as-grown (i.e., uncoated) emitter was 134μA-620V. In addition, the CNT emitters coated with thin CN or BN films also showed much better long-term (up to 25h) stability behaviors in electron emission, as compared with the conventional CNT emitter.

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Abstract
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2. 본론
3. 결론
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UCI(KEPA) : I410-ECN-0101-2010-560-003202300