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This paper reviews the dielectric breakdown resistance and behavior of anodic oxide films in air environment. It begins with a description of the dielectric breakdown mechanisms of dielectric materials. The paper then introduces different types of dielectric materials and compares them in terms of dielectric strength, thermal conductivity, mechanical strength and cost. Next, the paper summarizes various fabrication methods for dielectric aluminum oxide layers, discussing the advantages and disadvantages of each method. Finally, it provides an overview of current studies on the dielectric breakdown properties of anodic aluminum oxide films formed on different aluminum alloys in various electrolytes.
목차
Abstract
1. Introduction
2. Dielectric breakdown mechanism of dielectric materials
3. Types of dielectric materials
4. Fabrication methods for dielectric aluminum oxide layers
5. Current studies on dielectric breakdown of anodic aluminum oxide films
6. Conclusions
References
참고문헌 (38)
참고문헌 신청
J.M. Runge, The Metallurgy of Anodizing Aluminum, Springer, Cham, Switzerland (2018) 40-57.
J.R. Davis, Aluminum and Aluminum Alloys, ASM International, Materials Park, Ohio, USA (1993) 351-416.
Y. Sun, The use of aluminum alloys in structures: Review and outlook, Structures, 57 (2023) 105290.
W. Lee, S.J. Park, Porous anodic aluminum oxide: Anodization and templated synthesis of functional nanostructures, Chemical Reviews, 114 (2014) 7487-7556.
V. Dias, H. Maciel, M. Fraga, A.O. Lobo, R. Pessoa, F.R. Marciano, Atomic layer deposited TiO2 and Al2O3 thin films as coatings for aluminum food packaging application, Materials, 12 (2019) 682.
J.R. Davis, Aluminum and Aluminum Alloys, ASM International, Materials Park, Ohio, USA (1993) 351-416.
Y. Sun, The use of aluminum alloys in structures: Review and outlook, Structures, 57 (2023) 105290.
W. Lee, S.J. Park, Porous anodic aluminum oxide: Anodization and templated synthesis of functional nanostructures, Chemical Reviews, 114 (2014) 7487-7556.
V. Dias, H. Maciel, M. Fraga, A.O. Lobo, R. Pessoa, F.R. Marciano, Atomic layer deposited TiO2 and Al2O3 thin films as coatings for aluminum food packaging application, Materials, 12 (2019) 682.
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