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논문 기본 정보

자료유형
학술저널
저자정보
Junhee Hahn (Korea Research Institute of Standards and Science) Muhammad Ali Abro (MUET) Xiao Xiao (Sungkyunkwan University) Dong Bok Lee (Sungkyunkwan University)
저널정보
대한금속·재료학회 Metals and Materials International Metals and Materials International Vol.27 No.9
발행연도
2021.9
수록면
3,260 - 3,268 (9page)
DOI
10.1007/s12540-020-00665-1

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초록· 키워드

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A multilayered TiAlSiN thin film consisting of alternating nanocrystalline Ti(Si)N and Al(Si)N nanolayers was deposited onsteel by arc ion plating. The film composition was 26Ti?16.3Al?1.2Si?56.50N in at%. The film was corroded at 800?1000 °Cfor 4?100 h in N2/0.1%H2S gas to study its corrosion behavior in hostile (H, S)-containing environments. The corrosion wasprimarily governed by oxidation, because oxides of Ti and Al were much more stable than the corresponding sulfides. Theoxygen source for oxidation was impurity oxygen in N2/0.1%H2S gas. Initially, a superficial Al2O3scale formed. Soon, thescale developed into the outer TiO2-rich layer and the inner Al2O3-rich layer, beneath which formed an oxygen affected zone. As corrosion progressed, Si tended to accumulate in the lower part of the inner Al2O3-rich layer owing to its thermodynamicnobility. Preferential oxidation of Al to Al2O3,formation of fine, dense Al2O3and TiO2grains in the oxide scale, and strongTi?Si, Al?N and Ti?N bonds in the TiAlSiN film caused the scale to grow quite slowly and suppressed fast inward diffusionof sulfur and hydrogen as well as fast outward diffusion of Ti, Al, and Si. Therefore, the film displayed good corrosionresistance at 800?900 °C for up to 100 h. However, it corroded completely, with partial scale spallation and whisker growthat 1000 °C for 50 h.

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