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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 2021.12
- 수록면
- 71 - 77 (7page)
- DOI
- 10.9726/kspse.2021.25.6.071
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초록· 키워드
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This paper describes a performance test of Stirling cooler developed for ultra-low temperature application. A Stirling cooler has advantages of low GWP refrigerant, high efficiency and wide operating range compared with conventional ultra low temperature refrigerator. In this research, the Stirling cooler driven by a linear compressor is developed and the cooling performance test is performed at -100°C and -150°C. In cooling performance test, the input voltage is adjusted in the range from 150 to 210 Vrms. With the measured data, it is investigated the dynamic behavior and cooling performance of the developed Stirling cooler. The developed cooler shows 362 W of cooling capacity and 0.480 of COP at -100°C. At -150°C of the cold-end temperature, the cooling capacity and COP are 159 W and 0.186, respectively.
목차
Abstract
1. 서론
2. 냉동기 및 실험장치
3. 실험 결과 및 토의
4. 결론
References
참고문헌 (8)
참고문헌 신청
W. B. White / 2011 / Sustainable High Technology Cooling Systems are Meeting the Need for Energy-Efficient Ultra Low Refrigeration / International Pharmaceutical Industry 4(4):104~106
David Berchowitz / 2012 / Environmental Profiles of Stirling-Cooled and Cascade-Cooled Ultra-Low Temperature Freezers / Sustainability 4(11):2838~2851
Askar Rezvanov / 2017 / Cryogenic etching of porous low-k dielectrics in CF 3 Br and CF 4 plasmas / Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 35(2):021204
Marcel W. Pruessner / 2007 / Cryogenic etch process development for profile control of high aspect-ratio submicron silicon trenches / Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 25(1):21
R. Dussart / 2014 / Plasma cryogenic etching of silicon : from the early days to today’s advanced technologies / Journal of Physics D : Applied Physics 47(12):123001
David Berchowitz / 2012 / Environmental Profiles of Stirling-Cooled and Cascade-Cooled Ultra-Low Temperature Freezers / Sustainability 4(11):2838~2851
Askar Rezvanov / 2017 / Cryogenic etching of porous low-k dielectrics in CF 3 Br and CF 4 plasmas / Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 35(2):021204
Marcel W. Pruessner / 2007 / Cryogenic etch process development for profile control of high aspect-ratio submicron silicon trenches / Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 25(1):21
R. Dussart / 2014 / Plasma cryogenic etching of silicon : from the early days to today’s advanced technologies / Journal of Physics D : Applied Physics 47(12):123001
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