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논문 기본 정보

자료유형
학술저널
저자정보
Chang Weon Song (Pusan National University) Mi Young You (Pusan National University) Damin Lee (Pusan National University) Hyoung Seok Mun (Pusan National University) Seohan Kim (Pusan National University) Pung Keun Song (Pusan National University)
저널정보
한국표면공학회 한국표면공학회지 한국표면공학회지 제53권 제5호
발행연도
2020.10
수록면
241 - 248 (8page)

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초록· 키워드

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The change of the deposition behavior of diamond through a pretreatment process of the base metal prior to diamond deposition using HFCVD was investigated. To improve the specific surface area of the base material, sanding was performed using sandblasting first, and chemical etching treatment was performed to further improve the uniform specific surface area. Chemical etching was performed by immersing the base material in HCl solutions with various etching time. Thereafter, seeding was performed by immersing the sanded and etched base material in a diamond seeding solution. Diamond deposition according to all pretreatment conditions was performed under the same conditions. Methane was used as the carbon source and hydrogen was used as the reaction gas. The most optimal conditions were found by analyzing the improvement of the specific surface area and uniformity, and the optimal diamond seeding solution concentration and immersion time were also obtained for the diamond particle seeding method. As a result, the sandblasted base material was immersed in 20% HCl for 60 minutes at 100 °C and chemically etched, and then immersed in a diamond seeding solution of 5 g/L and seeded using ultrasonic waves for 30 minutes. It was possible to obtain optimized economical diamond film growth rates.

목차

Abstract
1. Introduction
2. Experimental Details
3. Results and Discussion
4. Conclusions
References

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