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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국진공학회(ASCT) Journal of Korean Vacuum Science & Technology Journal of Korean Vacuum Science & Technology Vol.7 No.2
- 발행연도
- 2003.12
- 수록면
- 45 - 56 (12page)
이용수
초록· 키워드
오류제보하기
A high flux metal plasma pulse ion source, which can simultaneously perform ion implantation and deposition, was developed and tested to evaluate its performance using the prototype. Flux of ion source was measured to be 5 A and bi-polar pulse power supply with a peak voltage of 250 V, repetition of 20 ㎐ and width of 100 ㎲ has an output current of 2 ㎄ and average power of 2 ㎾. Trigger power supply is a high voltage pulse generator producing a peak voltage of 12 ㎸, peak current of 50 A and repetition rate of 20 ㎐. The acceleration column for providing target energy up to ion implantation is carefully designed and compatible with UHV (ultra high vacuum) application. Prototype systems including various ion sources are fabricated for the performance test in the vacuum and evaluated to be more competitive than the existing equipments through repeated deposition experiments.
목차
Abstract
1. Introduction
2. Principle of Metallic Plasma Production
3. Design and Fabrication of MEVVA Systems
4. Experimental Results and Discussion
5. Conclusion
Acknowledgements
References
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