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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국진공학회(ASCT) Journal of Korean Vacuum Science & Technology Journal of Korean Vacuum Science & Technology Vol.3 No.2
- 발행연도
- 1999.10
- 수록면
- 126 - 129 (4page)
이용수
초록· 키워드
오류제보하기
PbTiO₃ is a promising material with perovskite structure for pyroelectric sensor applications with its superior pyroelectric properties, low dielectric constants, and low piezoelectric constants. Growth of pyroelectric thin films, in general, needs relatively higher temperatures than those of conventional Si semiconductor processing. However, low growth temperature is advantageous for the device integration. We report the low temperature (350℃) growth of PbTiO₃ thin films by 3-gun DC magnetron reactive sputtering. The effects of substrate temperature, Pb-flux, and total pressure on crystallinity and preferred orientation of PbTiO₃ thin films are reported.
목차
Abstract
Ⅰ. Introduction
Ⅱ. Experiment
Ⅲ. Results and discussion.
Ⅳ. Conclusions
Acknowledgment
References
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