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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 대한산업공학회 Industrial Engineering & Management Systems Industrial Engineering & Management Systems 제9권 제3호
- 발행연도
- 2010.9
- 수록면
- 262 - 274 (13page)
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초록· 키워드
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This article investigates how to adaptively predict the time-varying metrology delay that could realistically occur in the semiconductor manufacturing practice. Metrology delays pose a great challenge for the existing run-to-run (R2R) controllers, driving the process output significantly away from target if not adequately predicted. First, the expected asymptotic double exponentially weighted moving average (DEWMA) control output, by using the EWMA and recursive least squares (RLS) prediction methods, is derived. It has been found that the relationships between the expected control output and target in both estimation methods are parallel, and six cases are addressed. Within the context of time-varying metrology delay, this paper presents a modified recursive least squares-linear trend (RLS-LT) controller, in combination with runs test. Simulated single input-single output (SISO) R2R processes subject to various time-varying metrology delay scenarios are used as a test-bed to evaluate the proposed algorithms. The simulation results indicate that the modified RLS-LT controller can yield the process output more accurately on target with smaller mean squared error (MSE) than the original RLSLT controller that only deals with constant metrology delays.
목차
Abstract
1. INTRODUCTION AND BACKGROUND
2. DEWMA AND RLS-LT CONTROLLER WITHOUT METROLOGY DELAYS
3. RELATIONSHIP BETWEEN THE EXPECTED PROCESS OUTPUT AND TARGET IN THE PRESENCE OF METROLOGY DELAYS AND DETERMINISTIC DRIFTS
4. PROPOSED RLS-LT CONTROLLER WITH METROLOGY DELAYS USING RUNS TEST
5. EXPERIMENTAL STUDY OF THE MODIFIED RLS-LT CONTROLLER WITH TIME-VARYING METROLOGY DELAYS
6. CONCLUSION
REFERENCES
APPENDIX Ⅰ
APPENDIX Ⅱ
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UCI(KEPA) : I410-ECN-0101-2013-530-003636357