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자료유형
학술저널
저자정보
박혜선 (포항산업과학연구원) 양지훈 (포항산업과학연구원) 정재훈 (포항산업과학연구원) 송민아 (포항산업과학연구원) 정재인 (포항산업과학연구원)
저널정보
한국표면공학회 한국표면공학회지 한국표면공학회지 제45권 제3호
발행연도
2012.6
수록면
109 - 114 (6page)

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Oblique angle deposition (OAD) is a physical vapor deposition method which utilizes non-normal angles between the substrate and the vaporizing source. It has been known that tilting the substrate changes the properties of the film deposited on it, which was thought to be a result of morphological change of the film. In this study, OAD has been applied to prepare single and multilayer Al films by magnetron sputtering. The magnetron sputtering source of 4 inch diameter was used to deposit the films. Al films have been deposited on Si wafers and cold-rolled steel sheets. The multilayer films were prepared by changing the tilting angle upside down at each layer interval, which means that when the first layer was deposited at an angle of +45°, the second layer was deposited at an angle of ?45°, and vice versa. The microstructure, surface roughness and reflectance of the films were investigated using a scanning electron microscope, a surface profiler and a spectrophotometer, respectively. The corrosion resistance was measured and compared using the salt spray test. The single layer film prepared at an oblique angle of 60° showed a smoother surface than the films prepared at other angles. However, for the multilayer films, the film prepared at an oblique angle of 45° showed the most compact and featureless structure. The multilayer films were found to exhibit higher corrosion resistance than the single layer films.

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Abstract
1. 서론
2. 실험 방법
3. 결과 및 고찰
4. 결론
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