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논문 기본 정보
- 자료유형
- 학술대회자료
- 저자정보
- 발행연도
- 1996.6
- 수록면
- 57 - 63 (7page)
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초록· 키워드
오류제보하기
A bifacial buried contact (BBC) silicon solar cell had been designed and constructed. The processing sequence was developed to account for the introduction of the rear grooves. The extra steps introduced include scribing of the rear grooves, the subsequent boron diffusion into these grooves, and oxide growth in the rear grooves to provide a mask against heavy phosphorus diffusion of the front grooves. The need for very shallow emitter and rear floating junction for this structure necessitated the emitter formation at temperatures below 800℃. The rear groove boron diffusion was specially monitored to determine the optimum conditions for good cell output parameters. This paper reports on the developmental work done to implement the BBC silicon solar cell.
목차
Abstract
1. Introduction
2. Cell fabrication
3. Rear Contact Design and Optimization
4. Rear boron groove diffusion
5. Optimization of Rear Groove Masking Oxide
6. Problems associated with boron diffusion process
7. Thin Oxide(＜4000 Å) Processing and the use of textured wafers
8. Discussion
9. Conclusion
REFERENCES
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UCI(KEPA) : I410-ECN-0101-2009-563-018150177