원자층 증착법으로 공정된 Al2O3/TiO2 다층 박막의 투습 및 광투과 특성에 대한 연구 :Moisture encapsulation and optical transmittance characteristics of atomic layer deposited Al2O3 / TiO2 Multilayer thin film

이사야

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자료유형: 학위논문

저자정보: 이사야 (단국대학교, 단국대학교 대학원)

지도교수: 류상욱

발행연도: 2019

저작권: 단국대학교 논문은 저작권에 의해 보호받습니다.

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2019

원자층 증착법으로 공정된 Al2O3/TiO2 다층 박막의 투습 및 광투과 특성에 대한 연구

이사야 전자전기공학과 2019.01 학위논문

2017

OLED의 Barrier와 Encapsulation을 위한 원자층 증착 기술로 공정된 Al2O3/TiO2/Al2O3 다층 필름

이사야 , 송윤석 , 김현 외 1명 반도체디스플레이기술학회지 2017.01 학술저널

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본 연구에서는 OLED의 봉지공정을 위해 Al2O3/TiO2 다층박막을 기반으로하는 Thin Film Encapsulation을 제작하여 전기적 ? 광학적 특성을 조사, 연구하였으며 제작된 봉지박막을 OLED에 적용하여 실제 응용 가능성을 분석하였다. TFE의 증착 공정방법은 sol-gel, sputtering, PVD, CVD 등 여러 가지방식이 존재하지만, nm단위의 두께제어, 낮은 공정온도, 표면의 뛰어난 균질성, 고밀도의 박막을 구현할 수 있는 ALD 공정 방식을 통해 박막을 증착하였다.

첫째로, Al2O3 단일 박막과 TiO2 단일 박막을 ALD 공정으로 제작하였다. 전구체와 반응물질의 pulse time을 조절하고 spectroscopic ellipsometry 분석을 통하여 0.5 sec의 pulse time이 가장 높은 굴절율을 가져 고밀도의 박막을 만드는데에 최적의 공정조건임을 확인하였다. 또한 Al2O3/TiO2/Al2O3 다층 박막을 제작하고 MOCON Acuatron2를 통해 WVTR를 분석하였는데 장비 한계치인 5x10-5 g/m2/day 의 측정 한계치가 측정되었다. 그러나 청색파장대인 400nm에서 85% 이하의 투과율이 측정되었다.

두번째로, Al2O3/polymer/Al2O3 TFE을 제작하여 실제 OLED 소자에 적용하여 60℃/90% 환경에서 신뢰도 평가를 진행하였다. 다층 박막에서 각각의 Al2O3막의 두께를 30nm,50nm로 증착하여 비교하고 1.5Dyad와 2.5Dyad로 증 착하여 비교하였다. 이는 Dyad의 변화와 무기층의 두께 변화를 통해Transmittance path와 공정시간이 실제 디바이스에 주는 영향을 보기 위함이다. 예상된데로 1.5Dyad보다 2.5Dyad가 Transmittance path가 길어짐에 따라 Current Efficiency 변화가 작아지며 안정적인 특성을 보여주었다. 하지만 Al2O3의 두께가 두꺼워지거나 2.5Dyad의 구조로 증착을 할 때 길어지는 공정시간과 유기물과 무기물을 번갈아 가며 증착할 때 주는 스트레스로 인한 효율 감소가 더 크게 작용함을 알 수 있었다. 결과적으로 1.5Dyad의 구조로 Al2O3 막을 30nm로 증착할 때 가장 좋은 OLED 전류 효율을 얻었다.

마지막으로, 첫 번째 실험에서 진행했던 Al2O3/TiO2/Al2O3 다층 박막을 개선하는 실험을 진행하였다. 해당 막은 얇은 두께와 우수한 투습 특성을 가졌지만 청색파장대에서 투과율이 낮아 OLED의 상부층 봉지막으로는 사용할 수 없었다. 물질의 변화나 총 두께의 큰 변화없이 광학 어드미턴스 궤적을 분석하고 분석을 토대로 TiO2 막 사이에 Al2O3 막을 삽입하여 반사율을 감소시켜 투과율을 개선하였다. 400nm 파장대에서 85%이하이던 투과율이 93%로 8%가 증가하였고 모든 파장대에서 90%이상의 투과율 특성을 보여 전면 발광 OLED에서 빛이 직접적으로 통과하는 상부 봉지층으로 사용 할 수 있음을 보였다. WVTR 역시 장비 한계치인 5x10-5 g/m2/day 의 측정 한계치가 측정되었다.

In this study, we produced thin film based on Al2O3/TiO2 multi-layer for encapsulation of OLED, investigated and researched electrical and optical characteristics, and applied manufactured OLED for analysis of actual application. Although there are various methods for deposition process of TFE, such as sol-gel, printing, PVD, CVD, etc., thin film was deposited through ALD process method that can implement thickness control of nm, excellent unifomity and high density.

First, Al2O3 thin films and TiO2 thin films were produced in ALD processes. The pulse time of precursors and reactants was adjusted, and the spectroscopic elipometry analysis confirmed that 0.5sec pulse time was the best process condition to produce a film of high density with the highest refractive index. In addition, the measurement limits of equipment limit of 5x10-5 g/m2/day were measured by manufacturing multi-layer thin films of Al2O3/TiO2/Al2O3 and analyzing WVTR through MOCON Acuatron2. However, a transmission rate of 85% or less was measured at the blue wavelength of 400nm.

Second, reliability evaluation was carried out in a 60°C/90% environment by manufacturing Al2O3/polymer/Al2O3 TFE and applying it to actual OLED devices. In multi-layer thin films, the thickness of each Al2O3 film was compared to 30nm and 50nm, and then to 1.5Dyad and 2.5Dyad. This is to see how the transmission path and the process time affect the actual device through changes in the Dyad and the thickness of the weapon layer. As expected, 2.5Dyad over 1.5Dyad has shown stable characteristics as its transmission path is longer. However, it was shown that the reduction in efficiency due to the process time that increases when the thickness of Al2O3 is thickened or deposited in a 2.5Dyad structure, and the stress
of evaporation alternately between organic and inorganic matters were significantly affected. As a result, the best OLED current efficiency was obtained when the Al2O3 film was deposited to a thickness of 30 nm with a structure of 1.5Dyad.

Finally, an experiment was conducted to improve the Al2O3 / TiO2 / Al2O3 multilayer thin film which was carried out in the first experiment. ATA Thinfilm has excellent moisture encapsulation but has low transmittance, so it was not suitable for use as an upper encapsulation layer for OLEDs. The optical admittance was analyzed to improve the transmittance by inserting an Al2O3 film between the TiO2 film without changing material and entire thickness. The transmittance was increased to 93%, which was less than 85% at 400 nm wavelength band. The transmittance was 90% or more at all wavelengths, indicating that the OLED can be used as an upper encapsulation layer. The WVTR also has a measurement limit of 5x10-5 g/m2/day, which is the equipment limit.

Ⅰ. 서론
1.1 디스플레이 개요 ·····································································································1
1.2 유기발광 다이오드의 구조 ···················································································2
1.3 유기발광 다이오드의 열화 ···················································································3
1.4 Fick’s law ··············································································································4
1.5 유기발광 다이오드의 봉지공정 ···········································································6
1.6 원자층 증착 기술 ···································································································7
Ⅱ. OLED의 Barrier와 Encapsulation을 위한 Al2O3/TiO2/Al2O3 다층 필름의 특성 연구
2.1 실험 목적 ·················································································································9
2.2 실험 방법 ·················································································································10
2.3 결과 및 고찰 ···········································································································10
2.4 결론 ···························································································································17
Ⅲ. OLED의 Barrier와 Encapsulation을 위한 polymer / Al2O3 다층 필름의 온습도 신
뢰도 평가 분석 및 연구
3.1 실험 목적 ·················································································································18
3.2 실험 방법 ·················································································································19
3.3 결과 및 고찰 ···········································································································19
3.4 결론 ···························································································································27
Ⅳ. OLED Encapsulation의 투과도 개선을 위해 Optical Admittance를 사용한
Al2O3/TiO2 다층 박막의 특성 연구
4.1 실험 목적 ·················································································································28
4.2 실험 방법 ·················································································································32
4.3 결과 및 고찰 ···········································································································32
4.3 결론 ···························································································································39
Ⅴ. 결론 및 향후과제 ······································································································40
참고문헌 ·····························································································································42

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