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학위논문
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유현철 (한국산업기술대학교, 한국산업기술대학교 지식기반기술 에너지대학원)

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2014
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한국산업기술대학교 논문은 저작권에 의해 보호받습니다.

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이 논문의 연구 히스토리 (2)

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본 연구는 전해 Cu Via-Filling시 첨가제에 따른 특성평가를 위하여 CuSO4· 5H2O와 H2SO4 을 첨가한 욕을 기본으로 Galvanostat 측정 및 전해 도금 방법을 이용하여, 각각의 Cl-과 PEG 그리고 Cl-과 SPS의 첨가량을 달리하여 나타난 도금욕의 potential 변화 및 비아 홀의 필링 형상을 통해 염소이온 억제제와 가속제에 대해 미치는 영향을 분석하였다.
전해 Cu Via-Filling도금은 금속염과 전도도염은 CuSO4·5H2O와 H2SO4을 사용하였으며, 촉진제는 Cl-, 억제제는 PEG(polyethylene glycol), 가속제는 SPS (bis(3- sulfopropyl) disulfide)를 사용하였다. 도금액의 potential 측정은 임피던스 분석기를 이용하였으며, 측정 된 potential의 변화를 통하여 도금액에 각각의 첨가제의 첨가량에 따른 억제 및 가속 효과를 평가하였으며, 첨가량 변화에 따른 Cu Via-Filling 현상을 관찰하였다.
potential 변화를 통해 PEG가 억제효과를 갖는 것을 알 수 있으며. 염소이온 40 ppm 이상에서 PEG의 억제효과는 감소하였으며, 감소효과는 PEG 첨가량이 적을수록 증가하였다. 이는 두 첨가제 간의 비율에 관계가 있는 것으로 확인되었다. 반면 potential 변화를 통해 SPS는 가속효과를 갖는 것을 알 수 있었으며, SPS 첨가량이 증가할수록 가속효과는 증가하였으나, 염소이온 첨가에 의한 가속효과 변화는 미미하였다. 그리고 Cu Via-Filling 현상을 통해 염소이온과 PEG 두첨가제의 비율이 1:5~1:10 범위에서 PEG의 억제효과가 크게 증가하여 비아 홀 전체적으로 Cu의 석출이 억제되는 것을 보았다. 반면 염소이온은 Via-Filling 단면관찰 결과 SPS의 가속효과에 미미한 영향을 미치는 것으로 확인되었다. 또한 PEG와 SPS 두 가지를 첨가한 용액에서 Via-Filling 후 단면관찰 결과에서도 염소이온은 SPS의 가속효과에 큰 영향을 미치지 않았으며, 염소이온과 PEG 두첨가제를 첨가했을 때와 마찬가지로 특정한 비율에서 억제효과가 유지 되는 것이 확인되었다.

목차

목 차
List of Tables·································································· ⅲ
List of Figure Captions······················································· ⅳ
국문요약 ······································································· ⅵ
1. 서론 ·········································································· 1
2. 이론적 배경 ································································· 2
2.1. PCB(인쇄회로기판) ····················································· 2
2.1.1. PCB 종류와 특성 ···················································· 2
2.2. 비아 홀 ·································································· 4
2.2.1. 비아 홀의 역할 ······················································ 4
2.3. 전해 도금법 ····························································· 4
2.3.1. 전해 도금의 원리 ··················································· 4
2.3.2. Faraday의 법칙 ······················································ 7
2.3.3. 전착기구 ······························································ 9
2.4. 첨가제의 영향 ·························································· 14
3. 실험 방법 ····································································· 16
3.1. Galvanostat 측정 ························································ 16
3.2. 전해 Cu Via-Filling ····················································· 18
4. 실험 결과 및 고찰 ··························································· 19
4.1. CuSO4·5H2O와 H2SO4의 농도에 따른 potential 변화 ················· 19
4.2. Cl-과 PEG, Cl-과 SPS 첨가량에 따른 potential변화 ·················· 22
4.3. Cl-과 PEG 첨가 비율에 따른 Cu Via-Filling 현상 ····················· 25
4.4. Cl-과 SPS 첨가 비율에 따른 Cu Via-Filling 현상 ······················ 30
4.5. Cl-과 PEG, SPS 첨가 비율에 따른 Cu Via-Filling 현상 ················ 32
5. 결론············································································ 34
참고 문헌········································································ 35
Abstract·········································································· 37

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