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논문 기본 정보

자료유형
학술저널
저자정보
김자은 (성균관대학교) 이선화 (Department of Electrical and Computer Engineering Sungkyunkwan University) Sanchari Chowdhury (성균관대학교) 이준신 (성균관대학교)
저널정보
한국전기전자재료학회 Transactions on Electrical and Electronic Materials Transactions on Electrical and Electronic Materials 제23권 제1호
발행연도
2022.2
수록면
1 - 5 (5page)
DOI
https://doi.org/10.1007/s42341-021-00366-5

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PERC technology is the dominant over the last decade in global photovoltaic market due to its lower cost and higher efficiency. Research works are still counting to reduce recombination loss and the passivation layer is key issue for reducing recombination and improving efficiency. This paper tried to obtain the optimized passivating contact properties and deposition techniques by introducing high-k Hafnium oxide (HfO x ) material for high efficiency PERC solar cell. HfO x is not only used as monolayer, but also used as doped with other materials or used with SiNx :H capping layer. However, in order to compare the properties with other materials, this paper only mentions the single layer properties. A comparative analysis of interface trap density, fixed charge and lifetime was performed which are key properties to obtain higher passivation. It was confirmed that HfOx deposited using ALD has a low interface trap density (D it ) of less than 2.0×10 12 eV ?1 cm ?2 , and can be adjusted to negative and positive fixed charge by deposition conditions or post-treatment process. As a result of simulation using HfOx as a passivation layer, the efficiency is 22.01%. It is expected that it will be possible to manufacture a solar cell with higher efficiency if the actual cell is fabricated by optimizing HfOx as a passivation layer based on the simulation result.

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