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논문 기본 정보
- 자료유형
- 학술대회자료
- 저자정보
- 저널정보
- 한국정보디스플레이학회 한국정보디스플레이학회 International Meeting 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
- 발행연도
- 2006.1
- 수록면
- 1,625 - 1,628 (4page)
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Two different negative-type photosensitive polyimides were synthesized and characterized for an application as an interdielectric layer in TFTLCD array. In the case of photocurable polyimides, the photosensitive moiety, 2-HHSP, was synthesized through 3 step reaction, and then was incorporated into side chains of polyimide precursor by post reaction. Optimum compositions of negative-type photocurable polyimde were also formulated. For photopolymerizable polyimides, two novel UV monomers containing imide linkages were prepared. An aqueous alkaline developable polymer matrix was synthesized by free radical copolymerization. A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. It was found that viaholes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.
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Synthesis of Imide Monomers for Application to Organic Photosensitive Interdielectric Layer
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Synthesis and Characterization of negative-type photosensitive polyimides` for TFT-LCD array
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A Study on Negative-type Photosensitive Polyimide Precursor Developable with Aqueous Alkaline Solution
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Synthesis and Characterization of Positive Photosensitive Polyimide
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Synthesis and characterization of a polyimide from a precursor containing photosensitive group
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Synthesis and Characterization of Positive-type Photosensitive Polyimide for Optical Applications
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Synthesis and Characterization of Alkali Developable Positive Type Photosensitive Polyimide for Colorless Interlayer Insulator in TFT-LCD Device
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Photosensitive polyimides in patterning for positive-tone photoresists
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The Investigation or syntheses and Thermal properties of Photosensitive Polyimides
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Novel Photosensitive Polyimide with Good Transparency
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Syntheses and Properties of Photosensitive Polyimides : Ⅰ. Effect of Structure on Photosensitive Property
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Positive Photosensitive Polyimide with for a High-Aperture-Ratio TFT-LCD
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2002 .04
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Positive Type Photoresist for Patterning of Interdielectric Layer of TFT Array
한국정보디스플레이학회 International Meeting
2007 .01
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Photosensitive Polyimide Dielectrics for High Aperture Ratio TFT-LCD
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Synthesis and Characterization of Novel Photosensitive Sulfonated Polyimides for Fuel Cell Application
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The Synthesis of Photosensitive Polyimide Using Various Groups for Application of Semiconductors
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Syntheses and Properties of Photosensitive Polyimide : Ⅱ. Effect of Structure on Thermal Properties
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