Properties of cobalt thin films deposited by PEALD using very high frequency (60 and 100 MHz)

박준모 ,  염원균 ,  송창훈 외 1명

한국진공학회 학술발표회초록집

2019 .08

Pure Cobalt Thin Film by using Very High frequency (60MHz) Plasma-Enhanced Atomic Layer Deposition

Chang Hoon Song ,  Won Kyun Yeom ,  Doo San Kim 외 3명

한국진공학회 학술발표회초록집

2018 .08

Plasma enhanced atomic layer deposition of silicon nitride using a VHF (162 MHz) plasma source

You Jin Ji ,  Ki Hyun Kim ,  Ki Seok Kim 외 5명

한국진공학회 학술발표회초록집

2020 .02

Plasma enhanced atomic layer deposition of silicon nitride films using a VHF (162 ㎒) multi-tile push-pull plasma source

You Jin Ji ,  Ki Hyun Kim ,  Ki Seok Kim 외 5명

한국진공학회 학술발표회초록집

2020 .08

Charateristic of cobalt thin films deposited by VHF PE-ALD (60 and 100 ㎒) using cobaltocene(Co(Cp)₂/NH₃

Won gyun Yeom ,  Chang hoon Song ,  Chul hee Cho 외 2명

한국진공학회 학술발표회초록집

2020 .08

초고주파 (162 MHz) 다중 분할 전극 플라즈마 소스를 이용한 silicon nitride PEALD 공정연구

지유진 ,  김기석 ,  김기현 외 5명

한국진공학회 학술발표회초록집

2019 .08

Nitriding process for semiconductor devices by using a multi-electrode VHF (162 MHz) plasma source

지유진 ,  김기석 ,  김기현 외 6명

한국진공학회 학술발표회초록집

2018 .08

Silicon nitride deposition by VHF (162 MHz)-PECVD using a multi-tile push-pull plasma source

Ki Seok KIM ,  Albe ,  t Roge 외 2명

한국진공학회 학술발표회초록집

2016 .08

VHF-PECVD for a-Si:H and a-SiN:H Film Deposition

Jin Seok Kim

Applied Science and Convergence Technology

2019 .09

CO oxidation catalyzed by NiO/mesoporous Al₂O₃

Sang Wook Han ,  Dae Han Kim ,  Eun Ji Pa 외 6명

한국진공학회 학술발표회초록집

2015 .02

In-situ formation of co particles encapsulated by graphene layers

Lee Minjeong ,  Kim Gyutae ,  Jeong Gyu Hyun 외 4명

한국현미경학회지

2022 .03

Characteristic analysis of HfO2 thin films deposited at low-temperature using direct plasma-enhanced atomic layer deposition

김경문 ,  윤순길 ,  정낙관

한국진공학회 학술발표회초록집

2020 .02

Atomic Layer Deposited Metal Thin Films on T-shirts

Han-Bo-Ram Lee

한국진공학회 학술발표회초록집

2017 .08

Application of Atomic Layer Deposition to Solid Oxide Fuel Cells Based on Nanoscale Electrode Modification

Jiwon Oh ,  Heesu Hwang ,  Seungmuk Bae 외 1명

한국진공학회 학술발표회초록집

2018 .08

Deposition and characterization of inorganic thin films by using UV-enhanced Atomic Layer Deposition

정진원 ,  성명모

한국진공학회 학술발표회초록집

2015 .02

Effects of Redeposition on Low-Temperature Plasma Enhanced-Atomic Layer Deposition of Silicon Nitride Thin films for the Encapsulation layer of flexible OLEDs

김지민 ,  김성민 ,  김형준

한국진공학회 학술발표회초록집

2018 .02

Layer controlled TMDC films by sulfurization of W film deposited by ALD method via Metal-Organic Chemical Vapor Deposition

이유빈 ,  이진석

한국진공학회 학술발표회초록집

2018 .02

Fabrication of ZnO inorganic thin films by using UV-enhanced Atomic Layer Deposition

송종수 ,  윤홍로 ,  성명모

한국진공학회 학술발표회초록집

2016 .02

Novel organic-inorganic thin films with monolayer precision using molecular layer deposition (MLD) and atomic layer deposition (ALD)

윤관혁 ,  김인정 ,  성명모

한국진공학회 학술발표회초록집

2015 .02

A study on the standardization for the analysis method of recycled cobalt metals through the urban mining

Deok-jun KWEON ,  Young-ki KIM ,  Won-pyo HONG 외 3명

한국분석과학회 학술대회

2016 .11