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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국진공학회(ASCT) Applied Science and Convergence Technology Applied Science and Convergence Technology Vol.25 No.6
- 발행연도
- 2016.11
- 수록면
- 145 - 148 (4page)
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This paper, Al-doped ZnO(AZO) thin films for application as transparent conducting oxide films were deposited on the Corning glass substrate by using RF magnetron sputtering system. The effects of various Argon gas flow rates on optical and electrical characteristics of AZO films were investigate sputtering method. The Carrier Concentration is enhanced as Ar gas rate increases, and also the oxygen vacancy concentration. The figure of merit obtained in this study means that AZO films which deposited Ar gas rate of 75 sccm have the highest Carrier concentration and Hall mobility, which have the highest photoelectrical performance that it could be used as transparent electrodes.
목차
Abstract
I. Introduction
II. Experiments
III. Results and Discussion
IV. Conclusions
References
참고문헌 (11)
참고문헌 신청
[학술지(정기간행물)] - 김덕규 / 2014 / Investigation of the Annealing Time Effects on the Properties of Sputtered ZnO:Al Thin Films / 한국진공학회지 23 (6) : 366 ~ 370
[학술지(정기간행물)] - X. Jiang / 2003 / / Appl. Phys. Lett 83 : 7875 ~
[학술지(정기간행물)] - J. Muller / 2004 / / Sol. Energy 77 : 917 ~
[학술지(정기간행물)] - T. Minami / 1996 / / J. Vac. Sci. Technol. A 14 : 1689 ~
[학술지(정기간행물)] - Deok Kyu Kim / 2015 / Properties of ZnO:Ga thin films deposited by RF magnetron sputtering under various RF power / 한국진공학회지 24 (6) : 242 ~ 244
[학술지(정기간행물)] - X. Jiang / 2003 / / Appl. Phys. Lett 83 : 7875 ~
[학술지(정기간행물)] - J. Muller / 2004 / / Sol. Energy 77 : 917 ~
[학술지(정기간행물)] - T. Minami / 1996 / / J. Vac. Sci. Technol. A 14 : 1689 ~
[학술지(정기간행물)] - Deok Kyu Kim / 2015 / Properties of ZnO:Ga thin films deposited by RF magnetron sputtering under various RF power / 한국진공학회지 24 (6) : 242 ~ 244
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UCI(KEPA) : I410-ECN-0101-2019-420-001276307