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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 2016.1
- 수록면
- 192 - 198 (7page)
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초록· 키워드
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An ultrasensitive method to detect trace anions (fluoride, nitrite and nitrate) in hydrogen peroxide (H2O2) for semiconductor by headspace solid phase microextraction (HS-SPME) gas chromatography-mass spectrometry (GC-MS) was described. Fluoride, nitrite and nitrate in hydrogen peroxide reacted with pentafluorobenzyl bromide (PFB-Br) in a headspace vial and the formed PFB derivatives were vaporized and adsorbed onto a fiber. The optimal HS-SPME conditions were achieved with a 50/30 μm divinylbenzene-carboxen- polydimethylsiloxan (DVB-CAR-PDMS) fiber, 50 μL of PFB-Br (99%), 100 μL of 10% tetraoctylammonium bromide (10%) as a phase transfer catalyst, an extraction/derivatization temperature of 90oC, a heating time of 50 min, and a pH of 6.0. Under the established conditions, the method detection limits of fluoride, nitrite and nitrate were 2.8-4.0 μg/L in 30% H2O2 solutions (w/w) and the relative standard deviations were less than 4% at concentrations of 25 and 50 μg/L. The concentrations of anions in five concentrated H2O2 had detectable levels of 8.7 to 28.4 μg/L. The method was sensitive, reproducible and simple enough to permit the reliable routine analysis of anions in hydrogen peroxide for semiconductor
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참고문헌 (12)
참고문헌 신청
Occupational Safety & Health Research Institute / 2012 / Health management assistant for the workers in the semiconductor industry :8~11
SEMIPARK
D. H. Yeum / 1999 / The behavior of hydrogen peroxide and ozone as oxidants in semiconductor wet cleaning chemicals
I. J. Malik / 1999 / Particle removal from semiconductor surfaces by chemical-mechanical cleaning:setting the record straight / Particles on Surfaces:Detection, Adhesion and Removal 6:335~352
M. Ye / 2004 / Determination of trace anions in hydrogen peroxide by electrolysis treatment / Journal of Zhejiang University. Science edition 31:184~187
SEMIPARK
D. H. Yeum / 1999 / The behavior of hydrogen peroxide and ozone as oxidants in semiconductor wet cleaning chemicals
I. J. Malik / 1999 / Particle removal from semiconductor surfaces by chemical-mechanical cleaning:setting the record straight / Particles on Surfaces:Detection, Adhesion and Removal 6:335~352
M. Ye / 2004 / Determination of trace anions in hydrogen peroxide by electrolysis treatment / Journal of Zhejiang University. Science edition 31:184~187
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