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Tin monosulfide thin films grown by atomic layer deposition using tetrakis(dimethylamino)tin for photovoltaic applications
한국진공학회 학술발표회초록집
2016 .08
The study of optical properties of SnxSy thin films grown by atomic layer deposition (ALD)
한국진공학회 학술발표회초록집
2017 .02
The effect of back electrode on electric properties of SnS thin film using atomic layer deposition
한국진공학회 학술발표회초록집
2018 .02
Effect of Post-Treatment on the Tin monosulfide Photocathode
한국진공학회 학술발표회초록집
2018 .02
CO oxidation catalyzed by NiO/mesoporous Al2O3
한국진공학회 학술발표회초록집
2015 .02
Fabrication of ZnO inorganic thin films by using UV-enhanced Atomic Layer Deposition
한국진공학회 학술발표회초록집
2016 .02
Effect of deposition temperature and thickness on surface properties of ALD TiO₂ films
한국진공학회 학술발표회초록집
2017 .02
The study of physical property for indium oxide grown by Atomic Layer Deposition (ALD)
한국진공학회 학술발표회초록집
2015 .02
Atomic layer deposition of highly stoichiometric Cu2SnS3 thin films as absorber materials for solar cells
한국진공학회 학술발표회초록집
2019 .08
In-Situ UV Illuminated Highly Conductive, Transparent ZnO Thin Film Electrode
한국진공학회 학술발표회초록집
2020 .02
Novel organic-inorganic thin films with monolayer precision using molecular layer deposition (MLD) and atomic layer deposition (ALD)
한국진공학회 학술발표회초록집
2015 .02
Novel Zinc Precursors for ZnO Thin Film Deposition by ALD
한국진공학회 학술발표회초록집
2020 .08
Improved photocatalytic activity of Sn(O,S)/TiO₂ synthesized by powder atomic layer deposition method
한국진공학회 학술발표회초록집
2019 .08
Deposition and characterization of inorganic thin films by using UV-enhanced Atomic Layer Deposition
한국진공학회 학술발표회초록집
2015 .02
Improvement of Electrical Properties of Sn-Doped Indium Tin Oxide by In-Situ Annealing
Applied Science and Convergence Technology
2022 .11
Application of Atomic Layer Deposition to Solid Oxide Fuel Cells Based on Nanoscale Electrode Modification
한국진공학회 학술발표회초록집
2018 .08
The Study of interface of In₂O₃ grown by atomic layer deposition (ALD) using Et₂InN(TMS)₂ as In precursor on Si(100)
한국진공학회 학술발표회초록집
2016 .08
Layer controlled TMDC films by sulfurization of W film deposited by ALD method via Metal-Organic Chemical Vapor Deposition
한국진공학회 학술발표회초록집
2018 .02
Pure Cobalt Thin Film by using Very High frequency (60MHz) Plasma-Enhanced Atomic Layer Deposition
한국진공학회 학술발표회초록집
2018 .08
Achieving New Phases and Functionality in ALD Thin Films for Next Generation Electronics
한국진공학회 학술발표회초록집
2018 .08
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