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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 대한전자공학회 JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE Journal of Semiconductor Technology and Science Vol.11 No.1
- 발행연도
- 2011.3
- 수록면
- 1 - 5 (5page)
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초록· 키워드
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To enter next process control, numerous approaches, including run-to-run (R2R) process control and fault detection and classification (FDC) have been suggested in semiconductor manufacturing industry as a facilitation of advanced process control. This paper introduces a novel type of optical plasma process monitoring system, called plasma eyes chromatic system (PECSTM) and presents its potential for the purpose of fault detection. Qualitatively comparison of optically acquired signal levels vs. process parameter modifications are successfully demonstrated, and we expect that PECSTM signal can be a useful indication of onset of process change in real-time for advanced process control (APC).
목차
Abstract
Ⅰ. INTRODUCTION
Ⅱ. OPTICAL PLASMA PROCESS MONITORING SYSTEM
Ⅲ. PLASMA PROCESS MONITORING
Ⅳ. CONCLUSIONS
ACKNOWLEDGMENTS
REFERENCES
참고문헌 (6)
참고문헌 신청
1. [학술지(정기간행물)] - J. Moyne / 2007 / SEMI E133-The Process Control System Standard: Deriving a Software Interoperability Standard for Advanced Process Control in Semiconductor Manufacturing / IEEE Trans. Semi. Manufac 30 (4) : 408 ~ 420
2. [학술지(정기간행물)] - S. J. Qin / 2006 / Semiconductor Manufacturing Process Control and Monitoring: A Fab-wide Framework / J. of Process Control 16 : 171 ~ 191
3. [학술지(정기간행물)] - P. Kang / 200912 / A virtual metrology system for semiconductor manufacturing / EXPERT SYSTEMS WITH APPLICATIONS 36 : 12554 ~ 12561
4. [학술대회논문] - J. Ahn / 2010 / Real-Time In-Situ Plasma Etch Process Monitoring for Sensor-Based Process Control Using PECSTM / In Proc. 17th Korean Semiconductor Conference
5. [학술지(정기간행물)] - H. H. Yue / 2001 / Plasma Etching Endpoint Detection Using Multiple Wavelengths for small-open area wafers / IEEE Trans. Semi. Manufac 19 (1) : 66 ~ 75
2. [학술지(정기간행물)] - S. J. Qin / 2006 / Semiconductor Manufacturing Process Control and Monitoring: A Fab-wide Framework / J. of Process Control 16 : 171 ~ 191
3. [학술지(정기간행물)] - P. Kang / 200912 / A virtual metrology system for semiconductor manufacturing / EXPERT SYSTEMS WITH APPLICATIONS 36 : 12554 ~ 12561
4. [학술대회논문] - J. Ahn / 2010 / Real-Time In-Situ Plasma Etch Process Monitoring for Sensor-Based Process Control Using PECSTM / In Proc. 17th Korean Semiconductor Conference
5. [학술지(정기간행물)] - H. H. Yue / 2001 / Plasma Etching Endpoint Detection Using Multiple Wavelengths for small-open area wafers / IEEE Trans. Semi. Manufac 19 (1) : 66 ~ 75
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