Cu growth on hydrogen plasma treated Cu by metal organic chemical vapor deposition

Hock Key Moon ,  Nae-Eung Lee

한국진공학회 학술발표회초록집

2009 .02

Characteristic of Ru Thin Film Deposited by ALD

Jingyu Pa ,  k ,  Heeyoung Jeon 외 3명

한국진공학회 학술발표회초록집

2013 .08

The enhanced nucleation behavior of atomic-layer-deposited Ru film on porous low-k dielectrics by $UV-O_3$ treatment

Heo ,  Jae-Yeong ,  Lee 외 10명

한국결정학회 학술연구발표회

2007 .01

Epitaxial $SnO_2$ Thin Films on Sapphire($1\bar{1}02$) and ($11\bar{2}0$) Deposited by Atomic Layer Deposition

Kim ,  Dai-Hong ,  Hong 외 1명

한국결정학회 학술연구발표회

2007 .01

Effect of Thermal Annealing on the Agglomeration Behavior of Ru Thin Films Prepared by Metal-Organic Chemical Vapor Deposition

Kim ,  Beom-Seok ,  Kim 외 1명

한국결정학회 학술연구발표회

2007 .01

Multilayer barrier film fabricated by Plasma Enhanced Chemical Vapor Deposition and Atomic Layer Deposition

Chang-Kyu Jin ,  Do-Kyung Hwang ,  Tae-Hwan Kim 외 1명

한국진공학회 학술발표회초록집

2014 .08

Deposition and characterization of Ti - Al - N thin films deposited by plasma - assisted atomic layer deposition

Yong Ju Lee ,  Sang-Won Kang

한국진공학회 학술발표회초록집

2002 .06

Atomic Layer Deposited Metal Thin Films on T-shirts

Han-Bo-Ram Lee

한국진공학회 학술발표회초록집

2017 .08

Atomic Layer Deposition of Ruthenium Thin Film from Ru (cymene) (1,5-hexadiene) and O2

정효준 ,  정은애 ,  한정환 외 6명

한국진공학회 학술발표회초록집

2014 .02

Layer-by-layer deposition of chemical-vapor-deposition-grown graphenes

Daeyoon KIM ,  Jeong Kyun NOH ,  Jae-Hee HAN

한국진공학회 학술발표회초록집

2016 .08

Development of an Improved Numerical Methodology for Design and Modification of Large Area Plasma Processing Chamber

김호준 ,  이승무 ,  원제형

한국진공학회 학술발표회초록집

2014 .02

Growth of carbon nanotubes on metal substrates using plasma - enhanced chemical vapor deposition

Se ,  ng-Ye ,  l Pa 외 9명

한국진공학회 학술발표회초록집

2002 .06

Cu / Ru / Cu(001) 의 전자구조와 자성

조이현 ,  이재일 ,  홍순철

한국자기학회 학술연구발표회 논문개요집

1998 .10

Single crystal graphene synthesis on oxidation Cu foil by CVD

박지상 ,  정대성 ,  윤혜주 외 2명

한국진공학회 학술발표회초록집

2017 .08

Cu film growth on Si substrate by combining plasma enhanced chemical vapor deposition with partially ionized beam deposition

K. H. Kim ,  S. C. Choi ,  D. J. Choi 외 5명

한국진공학회 학술발표회초록집

1997 .07

Characteristic analysis of HfO2 thin films deposited at low-temperature using direct plasma-enhanced atomic layer deposition

김경문 ,  윤순길 ,  정낙관

한국진공학회 학술발표회초록집

2020 .02

Phase Transition and Magnetic Transport Properties for Single Crystal of (Ca_0.42Sr_0.58)₃Ru₂O₇

Qing Ji ,  Ming Fu ,  Jianjian Ge 외 4명

한국자기학회 학술연구발표회 논문개요집

2008 .12

Electric Characteristics of HfO₂ deposited by Atomic Layer Deposition

김수현 ,  박재경 ,  노용한

한국진공학회 학술발표회초록집

2008 .08

The effect of nucleation layer growth rate on structural and electrical properties of GaN grown by metalorganic chemical vapor deposition(MOCVD)

김동준 ,  문용태 ,  안광순 외 2명

한국진공학회 학술발표회초록집

1998 .07

Synthesis of layer-controlled two-dimensional β-Cu₂S by chemical vapor deposition

Rauf Shahzad ,  TaeWan Kim ,  Jihun Mun 외 4명

한국진공학회 학술발표회초록집

2017 .08