지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
커뮤니티
연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국진공학회(ASCT) Applied Science and Convergence Technology Applied Science and Convergence Technology Vol.33 No.5
- 발행연도
- 2024.9
- 수록면
- 108 - 116 (9page)
이용수
초록· 키워드
오류제보하기
Cryogenic etching has become a crucial technology in semiconductor manufacturing, particularly for high aspect ratio structures, low-k materials, black silicon (b-Si), and various sensor applications. This technique effectively addresses issues such as scalloping and notching that occur in the Bosch process, while also minimizing plasma-induced damage. In cryogenic environments, the formation of SiO<sub>x</sub>F<sub>y</sub> passivation layers enables anisotropic etching, allowing for the creation of complex and highly precise microstructures. For b-Si, the nanostructures formed on the surface enhance light absorption, significantly improving the performance of applications such as solar cells, photonic sensors, and infrared detectors. Additionally, cryogenic etching helps preserve the electrical properties of porous low-k materials, which is essential for maintaining the reliability of next-generation high-performance devices. As semiconductor manufacturing evolves, cryogenic etching will play a key role in overcoming the limitations of conventional processes and enabling more precise and reliable devices.
목차
ABSTRACT
1. Introduction
2. Historical background and technical overview
3. Application of cryogenic etch process
4. Summary
References
참고문헌 (0)
참고문헌 신청함께 읽어보면 좋을 논문
논문 유사도에 따라 DBpia 가 추천하는 논문입니다. 함께 보면 좋을 연관 논문을 확인해보세요!
-
원자층 식각기술
한국진공학회 학술발표회초록집
2015 .02
-
C₃F6O 가스를 이용한 SiO₂에 대한 식각 특성 분석
한국진공학회 학술발표회초록집
2017 .08
-
Atomic layer etching of SiO₂ with low-global warming potential C₄H₃F₇O isomers
한국진공학회 학술발표회초록집
2021 .02
-
Applications of fluid based plasma simulation : dry etch
한국진공학회 학술발표회초록집
2018 .02
-
식각된 LED의 식각 깊이와 식각 각도가 광 추출 효율에 미치는 영향
새물리
2020 .10
-
Effects of surface etching on microstructure and mechanical strength of carbon fibers
Carbon letters
2018 .01
-
Magnetic Properties and Hysteresis Loss Improvement of Fe Alloy Powder by NH₄OH Etching
한국자기학회 학술연구발표회 논문개요집
2017 .05
-
Etching for Vertical Sidewall Formation in TiO₂ Nanorods
Applied Science and Convergence Technology
2022 .09
-
Effects of pulsed inductively coupled Cl₂/Ar plasma for the etching of Si nanostructure
한국진공학회 학술발표회초록집
2020 .02
-
다양한 etch gas를 이용한 자성 박막의 식각특성 분석
한국진공학회 학술발표회초록집
2017 .02
-
Sub-10 nm 수직 배향 DSA etch profile 향상에 대한 연구
한국진공학회 학술발표회초록집
2020 .02
-
A study on the ion beam etching characteristics in the high aspect ratio contact
한국진공학회 학술발표회초록집
2016 .08
-
Characteristics of SiO₂ Etching by Capacitively Coupled Plasma with Different Fluorocarbon Liquids (C7F14, C7F8) and Fluorocarbon Gas (C₄F8)
Applied Science and Convergence Technology
2021 .07
-
Ultrathin BP layer fabrication by photochemical etching
한국진공학회 학술발표회초록집
2017 .02
-
A perspective on patents on dry etching apparatus
한국진공학회 학술발표회초록집
2016 .08
-
Quantitative analysis of retained austenite in Nb added Fe-based alloy
한국현미경학회지
2022 .03
-
The optimize of chamber recovering conditions in plasma etching processes
한국진공학회 학술발표회초록집
2016 .08
-
MoS2 layer etching using CF4 plasma and H2S plasma treatment
한국진공학회 학술발표회초록집
2016 .02
-
Anisotropic Atomic Layer Etching of W by Fluorination-Oxidation Cyclic Process
한국진공학회 학술발표회초록집
2020 .02
-
Anisotropic/Isotropic Atomic Layer Etching of Metals
Applied Science and Convergence Technology
2020 .05
이 논문의 저자 정보
최근 본 자료
댓글(0)
0
UCI(KEPA) : I410-151-25-02-092600068