메뉴 건너뛰기
.. 내서재 .. 알림
소속 기관/학교 인증
인증하면 논문, 학술자료 등을  무료로 열람할 수 있어요.
한국대학교, 누리자동차, 시립도서관 등 나의 기관을 확인해보세요
(국내 대학 90% 이상 구독 중)
로그인 회원가입 고객센터 ENG
주제분류

추천
검색
질문

논문 기본 정보

자료유형
학술저널
저자정보
윤석철 (Hanbat National University) 신재호 (Korea Electronics Technology Institute) 김재웅 (Yeungnam University) 최균석 (Hanbat National University)
저널정보
대한전기학회 전기학회논문지 전기학회논문지 제73권 제2호
발행연도
2024.2
수록면
412 - 418 (7page)
DOI
10.5370/KIEE.2024.73.2.412

이용수

표지
📌
연구주제
📖
연구배경
🔬
연구방법
🏆
연구결과
AI에게 요청하기
추천
검색
질문

이 논문의 연구 히스토리 (2)

초록· 키워드

오류제보하기
In this study, a numerical analysis model was developed for temperature distribution history analysis. To verify the numerical model, the temperature accumulation results analyzed through simulation were compared with the temperature accumulation results for each layer measured with an IR camera. Through temperature distribution history analysis using the commercial program vAMfire/Macro Ⓡ, the maximum height at which the maximum temperature is reached in each process according to the change in cross-sectional area was predicted. In addition, the temperature distribution history for each support was analyzed considering general support, wall support, and modified wall support to minimize heat dissipation and heat accumulation. The difference in heat dissipation effect depending on the type of support was quantitatively analyzed. By applying optimal support, we were able to solve the stacking problem caused by heat accumulation. Through heat transfer analysis, it was confirmed that quantitative analysis was possible to solve problems such as lamination failure and thermal deformation.

목차

Abstract
1. 서론
2. 본론
3. 결론
References

참고문헌 (0)

참고문헌 신청

이 논문의 저자 정보

이 논문과 함께 이용한 논문

최근 본 자료

전체보기

댓글(0)

0