Due to the limitations of Moore"s Law, scaling down components in traditional CMOS processing and von Neumann architecture has gradually approached its constraints. Notably, Neuromorphic computing technology, which seeks to emulate the human brain, has gained significant attention. In this study, we have fabricated a two-terminal device which is based on Hf0.5Zr0.5O2 (HZO) thin films and is known as a Ferroelectric Tunnel Junction (FTJ). After device fabrication, we conducted P-V and I-V measurements to assess ferroelectric and memory properties. Then we evaluated the crystalline structure of HZO thin films through XRD analysis. Finally, we successfully implemented Synaptic Functions by applying pulse input.