지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
커뮤니티
연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
이용수
초록· 키워드
오류제보하기
In this research, we proceeded with research on plasma resistance of the cleaning process of APS(Atmospheric Plasma Spray)-Y₂O₃ coated parts used for semiconductor and display plasma process equipment. CF₄, O₂, and Ar mixed gas were used for the plasma environment, and respective alconox, surfactant, and piranha solution was used for the cleaning process. After APS-Y₂O₃ was exposed to CF₄ plasma, the surface changed from Y₂O₃ to YF₃ and a large amount of carbon was deposited. For this reason, the plasma corrosion resistance was lowered and contamination particles were generated. We performed a cleaning process to remove the defect-inducing surface YF₃ layer and carbon layer. Among three cleaning solutions, the piranha cleaning process had the highest detergency and the alconox cleaning process had the lowest detergency. Such results could be confirmed through the etching amount, morphology, composition, and accumulated contamination particle analysis results. Piranha cleaning process showed the highest detergency, but due to the very large thickness reduction, the base metal was exposed and a large number of contaminated particles were generated. In contrast, the surfactant cleaning process exhibit excellent properties in terms of surface detergency, etching amount, and accumulated contamination particle analysis.
목차
Abstract
1. 서론
2. 실험방법
3. 결과 및 고찰
4. 결론
References
참고문헌 (14)
참고문헌 신청
J.B. Song, J.T. Kim, S.S. Lee, S.G. Oh, E. Oh, J.Y. Yun, Reliability assessment of anodic films under plasma etching process, 2016 27th Annu. SEMI Adv. Semicond. Manuf. Conf. ASMC 2016. (2016) 233–236.
J.B. Song, J.T. Kim, S.G. Oh, J.S. Shin, J.R. Chun, J.Y. Yun, Effect of sealing time of anodic aluminum oxide (AAO) film for preventing plasma damage, Sci. Adv. Mater. 7 (2015) 127–132.
M. Kim, E. Choi, J. So, J.S. Shin, C.W. Chung, S.J. Maeng, J.Y. Yun, Improvement of corrosion properties of plasma in an aluminum alloy 6061-T6 by phytic acid anodization temperature, J. Mater. Res. Technol. 11 (2021) 219–226.
J. So, E. Choi, J.T. Kim, J.S. Shin, J.B. Song, M. Kim, C.W. Chung, J.Y. Yun, Improvement of plasma resistance of anodic aluminum-oxide film in sulfuric acid containing cerium(IV) ion, Coatings. 10.2 (2020) 103
H. Ashizawa, K. Yoshida, Effect of the microstructures of yttria ceramics on their plasma corrosion behavior, Ceram. Int. 45 (2019) 21162–21167.
J.B. Song, J.T. Kim, S.G. Oh, J.S. Shin, J.R. Chun, J.Y. Yun, Effect of sealing time of anodic aluminum oxide (AAO) film for preventing plasma damage, Sci. Adv. Mater. 7 (2015) 127–132.
M. Kim, E. Choi, J. So, J.S. Shin, C.W. Chung, S.J. Maeng, J.Y. Yun, Improvement of corrosion properties of plasma in an aluminum alloy 6061-T6 by phytic acid anodization temperature, J. Mater. Res. Technol. 11 (2021) 219–226.
J. So, E. Choi, J.T. Kim, J.S. Shin, J.B. Song, M. Kim, C.W. Chung, J.Y. Yun, Improvement of plasma resistance of anodic aluminum-oxide film in sulfuric acid containing cerium(IV) ion, Coatings. 10.2 (2020) 103
H. Ashizawa, K. Yoshida, Effect of the microstructures of yttria ceramics on their plasma corrosion behavior, Ceram. Int. 45 (2019) 21162–21167.
이 논문의 저자 정보
이 논문과 함께 이용한 논문
Chamber 내부 Coating 물질별 내플라즈마 저항 특성연구
박승현
,
윤민수
,
정현우
외 3명
한국진공학회 학술발표회초록집
2019
.08
해수 내 플라즈마 이온 질화 처리된 316L 스테인리스강의 부식 저항 특성
정상옥
,
박일초
,
김성종
한국표면공학회 학술발표회 초록집
2016
.05
식각공정 안정화를 위한 내플라즈마성 코팅부품의 신뢰성 평가방법 연구
이승수
,
송제범
,
김진태
외 4명
한국진공학회 학술발표회초록집
2014
.08
고밀도 플라즈마 내에서의 plasma species의 변화
김상권
,
김성완
,
O. Takai
한국표면공학회 학술발표회 초록집
2009
.05
최근 본 자료
댓글(0)
0
UCI(KEPA) : I410-ECN-0101-2022-581-000135493