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학술저널
저자정보
Wei Mu (Shanghai University) 곽은혜 (강원대학교) Bingan Chen (AIXTRON Nanoinstruments Ltd.) Shirong Huang (Shanghai University) Michael Edwards (Chalmers University of Technology) Yifeng Fu (Chalmers University of Technology) Kjell Jeppson (Shanghai University) Kenneth Teo (AIXTRON Nanoinstruments Ltd.) 정구환 (강원대학교) Johan Liu (Shanghai University)
저널정보
대한금속·재료학회 Electronic Materials Letters Electronic Materials Letters Vol.12 No.3
발행연도
2016.1
수록면
329 - 337 (9page)

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Synthesisof horizontally-aligned single-walled carbon nanotubes (HA-SWCNTs) bychemical vapor deposition (CVD) directly on quartz seems very promising for thefabrication of future nanoelectronic devices. In comparison to hot-wall CVD, synthesisof HA-SWCNTs in a cold-wall CVD chamber not only means shorter heating, coolingand growth periods, but also prevents contamination of the chamber. However, sincemost synthesis of HA-SWCNTs is performed in hot-wall reactors, adapting this wellestablishedprocess to a cold-wall chamber becomes extremely crucial. Here, in orderto transfer the CVD growth technology from a hot-wall to a cold-wall chamber, asystematic investigation has been conducted to determine the influence of processparameters on the HA-SWCNT’s growth. For two reasons, the cold-wall CVDchamber was upgraded with a top heater to complement the bottom substrate heater;the first reason to maintain a more uniform temperature profile during HA-SWCNTsgrowth, and the second reason to preheat the precursor gas flow before projecting itonto the catalyst. Our results show that the addition of a top heater had a significanteffect on the synthesis. Characterization of the CNTs shows that the average density ofHA-SWCNTs is around 1 - 2 tubes/μm with high growth quality as shown by Ramananalysis.

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